COMPACT MODELING OF SIGE HBTS USING VERILOG-A Except where reference is made to the work of others, the work described in this thesis is my own or was done in collaboration with my advisory committee. This thesis does not include proprietary or classified information. Zhiming Feng Certificate of Approval: Bogdan M. Wilamowski Professor Electrical and Computer Engineering Guofu Niu, Chair Professor Electrical and Computer Engineering Lloyd Stephen Riggs Professor Electrical and Computer Engineering Stephen L. McFarland Dean Graduate School COMPACT MODELING OF SIGE HBTS USING VERILOG-A Zhiming Feng A Thesis Submitted to the Graduate Faculty of Auburn University in Partial Fulfillment of the Requirements for the Degree of Master of Science Auburn, Alabama August 7, 2006 COMPACT MODELING OF SIGE HBTS USING VERILOG-A Zhiming Feng Permission is granted to Auburn University to make copies of this thesis at its discretion, upon the request of individuals or institutions and at their expense. The author reserves all publication rights. Signature of Author Date of Graduation iii VITA Zhiming Feng, son of Baogui Feng and Wenzhen Bian, was born on 29 April, 1973, in Daan, Jilin Province, P. R. China. He received his BS degree from Jilin University in 1995, majoring in Electronics and Information Systems. In Spring 2003, he was ac- cepted into the Electrical and Computer Engineering Department of Auburn University, Auburn, Alabama, where he has been pursuing his Masters degree. iv THESIS ABSTRACT COMPACT MODELING OF SIGE HBTS USING VERILOG-A Zhiming Feng Master of Science, August 7, 2006 (B.S., Jilin University, July, 1995) 123 Typed Pages Directed by Guofu Niu SiGe HBTs, integrated with CMOS, have demonstrated their usefulness in digital and analog circuit designs for wired and wireless telecommunication applications over the past decade. Of critical importance to successful circuit design is the availability of accurate device compact models and a good understanding of internal device character- istics, especially for analog RFIC designs. A technique that is beginning to be applied in research on device physics and com- pact modeling based on the Verilog-A hardware language is presented in this thesis. This new Verilog-A based model can be easily modified and implemented into circuit simu- lators such as Cadence and Agilent ADS without the need to interface with simulators. Moreover, the internal currents, charges, and noise sources are accessible, which is not the case when built-in models are used in circuit simulators. Using the Verilog-A based VBIC model, three applications for SiGe HBT noise modeling and VBIC temperature mapping models are presented. v First, a new inverse circuit simulation based low frequency noise extraction method is proposed based on the Verilog-A based VBIC model. The low frequency noise of de- vice biasing at high currents can be measured more accurately through this method. Secondly, in order to better understand the di?erent phase noise upconversion mecha- nisms involved in the base current 1/f noise and base current short noise in oscillator designs, the internal I BE and the internal I CE were separated from the external I BE and the external I CE using the Verilog-A based VBIC model. Clearly, the noise generat- ing current, I BE , is only a small portion of the terminal I B . In the third application, a group of improved temperature mapping models that can be used to model of DC currents down to 43 K are presented. The new VBIC based model was implemented us- ing Verilog-A, compiled into binary code, and dynamically linked to a circuit simulator through its compact modeling interface. Excellent Gummel and output fitting across a wide temperature range from 300 K down to 43 K were achieved on a 50 GHz SiGe HBT device. Finally, the intermodulation linearity simulation capability of the VBIC, HICUM and Mextram models were evaluated using harmonic balance in a 200 GHz SiGe HBT technology. The impact of avalanche and selfheating on IIP3 were examined and a weak avalanche shown to have a significant impact on IIP3. These results provide valuable new insights into the device physics underlying linearity behavior and the use of quan- tified simulations for data comparison of linearity that will be useful for both designers and modelers. vi ACKNOWLEDGMENTS I would like to express my gratitude to my supervisor, Dr. Guofu Niu. Without him, this thesis would not have been possible. His patience and encouragement have carried me through di?cult times, and his insights and suggestions have helped to shape my research skills. I would also like to thank the other members of my committee, Dr. Bogdan Wilamowski, and Dr. Lloyd Stephen Riggs for the assistance they have provided. I would like to thank Ying Li, Chendong Zhu, and Laleh Najafizadeh for helping with device measurement, and Jun Pan for useful discussions on Cadence simulation tools. I thank all the students in our research group, Yan Cui, Jin Tang, Xiaoyun Wei, Kejun Xia, Yun Shi, Hua Yang, and Muthubalan Varadharajaperumal for the vivid dis- cussions we have had on various topics and the fun of being a member of this fantastic group. I am forever indebted to my family for the support they have provided me through my entire life, and in particular I must acknowledge my wife and best friend, Yan Cui, without whose love, encouragement and editing assistance, I would not have finished this thesis. This research would not have been possible without the financial assistance of the National Science Foundation under grants ECS-0119623 and ECS-0112923, NASA grant NNL05AA37C, and the Georgia Electronic Design Center at Georgia Tech. I am also grateful for the assistance of C. Moore, M. Watson, M. Beatty, L. Nadeau of NASA, E. Kolawa of JPL, and the IBM SiGe development group, as well the many contributions vii of the SiGe ETDP team, including: M. Mojarradi, B. Blalock, W. Johnson, R. Garbos, R. Berger, F. Dai, L. Peltz, A. Mantooth, P. McCluskey, M. Alles, R. Reed, A. Joseph, C. Eckert and J.D. Cressler. viii Style manual or journal used IEEE Transactions on Nuclear Science (together with the style known as ?aums?). Bibliography follows van Leunen?s A Handbook for Scholars. Computer software used The document preparation package T E X (specifically L A T E X) together with the departmental style-file aums.sty. The plots were generated using VossPlot R? and MATLAB R? . ix TABLE OF CONTENTS LIST OF FIGURES xiii LIST OF TABLES xvi 1INTRODUCTION AND OVERVIEW 1 1.1 Basic Principles of SiGe HBT ...................... 2 1.2 Thesis Contributions ........................... 7 2VERILOG-A LANGUAGE 10 2.1 Introduction of Verilog-A ......................... 11 2.2 Verilog-A basics .............................. 13 2.2.1 Example: Simple Diode ..................... 14 2.3 Summary ................................. 24 3 VBIC MODELING 25 3.1 Modeling of Transfer Current ....................... 28 3.2 Modeling of Internal EB and BC Diodes ................ 39 3.3 Modeling of Quasi-Saturation ...................... 40 3.4 The Parasitic PNP Transistor ....................... 41 3.5 Temperature Mapping ........................... 42 3.5.1 Resistance ............................ 42 3.5.2 Capacitance ............................ 43 3.5.3 Knee current I KF ......................... 43 3.5.4 Ideality Factor N F ........................ 44 3.5.5 Saturation Current I S ....................... 44 4VERILOG-A IMPLEMENTATION 47 4.1 Basic code description .......................... 47 4.2 Implementation into Simulators ..................... 49 4.2.1 Implementation into Agilent ADS ................ 49 4.2.2 Implementation into Cadence .................. 49 4.3 Main debugging issues .......................... 50 4.3.1 Syntax Errors ........................... 50 4.3.2 Convergence Problems ...................... 51 4.3.3 Logarithm Error ......................... 54 x 4.3.4 Noise Modeling .......................... 55 4.4 Comparison with built-in model ..................... 56 4.4.1 DC Simulation .......................... 57 4.4.2 ac Simulation ........................... 58 4.4.3 Noise Simulation ......................... 60 4.4.4 Large Signal Simulation ..................... 61 4.5 Summary ................................. 61 5USING VERILOG-A FOR SIGE HBT NOISE MODELING 63 5.1 Inverse circuit simulation for 1/f Noise ................. 63 5.2 Noise generating current in oscillators .................. 67 5.3 Summary ................................. 70 6TEMPERATURE SCALABLE MODELING OF DC CURRENTS 71 6.1 Evaluation of Temperature Mapping Models in VBIC .......... 73 6.2 Improved Temperature Mapping Models ................. 75 6.2.1 Improved N F Temperature Mapping Model ........... 76 6.2.2 Improved I S Temperature Mapping Model ........... 78 6.2.3 Improved I KF Temperature Mapping Model ........... 82 6.2.4 Temperature Mapping Models for R th and avc2......... 83 6.3 Simulation Results ............................ 84 6.4 Summary ................................. 87 7MODELING OF INTERMODULATION LINEARITY IN A 200 GHZ SIGE HBT TECHNOLOGY 88 7.1 Standard Breakdown HBT ........................ 90 7.2 High Breakdown HBT .......................... 92 7.3 Impact of Avalanche and Self-heating .................. 95 7.4 Summary ................................. 96 8CONCLUSIONS AND FUTURE WORK 98 8.1 Conclusions ................................ 98 8.2 Future Work ................................ 100 BIBLIOGRAPHY 101 AVERILOG-A CODE WITH KEY IMPROVED TEMPERATURE MAPPING MOD- ELS 105 A.1 Improved N F and N EI Temperature Mapping Models .......... 105 A.2 Improved E a,true , I S and I BEI Temperature Mapping Models ...... 106 xi A.3 Improved I KF Temperature Mapping Model ............... 107 xii LIST OF FIGURES 1.1 Energy band diagram of a graded-base SiGe HBT as compared to an identically constructed Si BJT. ...................... 3 1.2 Comparison of Gummel characteristics of a comparably constructed SiGe HBT and Si BJT. .......................... 4 1.3 Measured comparison of unity gain cuto? frequency f T as a function of collector current for a comparably constructed SiGe HBT and Si BJT. . 5 2.1 Equivalent circuit of junction diode. ................... 14 2.2 Simulated Diode I d ?V id and I d ?V d curves. .............. 22 2.3 (a) Simulated Diode q d , q di? , and q j vs V id . (b) Extracted Diode C ?V curves. ................................... 23 3.1 VBIC equivalent network ......................... 27 3.2 Band diagram of an intrinsic bipolar transistor. (a) V BEI = 0, V BCI = 0; (b) V BEI > 0, V BCI > 0........................... 29 3.3 Zero bias charge Q B0 , EB depletion charge Q JE , and CB depletion charge Q JC in the neutral base region. .................. 34 4.1 (a) Gummel curve comparison of Verilog-A based VBIC model and Cadence built-in VBIC model. (b) Output curve comparison of Verilog- A based VBIC model and Cadence built-in VBIC model. ........ 57 4.2 S-parameters vs V BE curves of Verilog-A based VBIC model and Ca- dence built-in VBIC model. ........................ 58 4.3 S-parameters vs f curves of Verilog-A based VBIC model and Cadence built-in VBIC model. ........................... 59 4.4 f T vs I C of Verilog-A based VBIC model and Cadence built-in VBIC model. .................................. 59 xiii 4.5 Bias and frequency dependence of NF min and R n of Verilog-A based VBIC model and Cadence built-in VBIC model. ............ 60 4.6 P out vs P in of Verilog-A based VBIC model and Cadence built-in VBIC model. .................................. 61 5.1 Small signal equivalent circuit assumed in the conventional method. . . 64 5.2 Comparison of S I BE spectra extracted to the proposed inverse circuit simulation and the conventional measurement method. V CB =2V,I BE =2 ?A. .................................... 66 5.3 A simplified large transistor model. ................... 68 5.4 Comparison of terminal I B and internal I BE for the 50 GHz HBT. The internal V BE is shown on the right y-axis. ................ 69 6.1 Comparison of Gummel curves from Cadence simulation results and measurement data at low temperatures. .................. 72 6.2 Comparison of extracted isothermal N F and N F temperature mapping model in VBIC. .............................. 74 6.3 Comparison of I S temperature mapping model in VBIC and extracted isothermal I S parameters. ......................... 76 6.4 Improved N EI and N F model with new equations. ........... 77 6.5 E a,true as a function of temperature fitted using Eq. (6.27). ........ 82 6.6 Improved I S fitting with new E a,true model. ............... 83 6.7 Improved I KF fitting with new temperature mapping model. ...... 84 6.8 (a) ImprovedI C -V BE fitting with new models, and (b) ImprovedI B -V BE fitting with new models. .......................... 85 6.9 Improved DC output fitting at (a) 175 K, and (b) 43 K, with new models. 86 7.1 Comparison of measured and VBIC simulated S 11 & S 12 vs frequency at V CE = 1.0 V, I C = 12.8 mA. Standard Breakdown HBT. ....... 90 xiv 7.2 Comparison of measured and VBIC simulated S 21 & S 22 vs frequency at V CE = 1.0 V, I C = 12.8 mA. Standard Breakdown HBT. ....... 91 7.3 Comparison of simulated and measured IIP3 at V CE = 1.0, 1.3, 1.6 and 1.9 V. Standard Breakdown HBT. ..................... 93 7.4 Comparison of simulated and measured IIP3 at V CE = 1.3, 1.9, 2.5 and 3.1 V. High Breakdown HBT. ....................... 94 7.5 Comparison of simulated and measured M-1 at V BE = 0.65 V. Standard Breakdown HBT. ............................. 96 7.6 Comparison of IIP3 simulated using di?erent combinations of avalanche and self-heating settings and measured IIP3 at V CE = 1.9 V. Standard Breakdown HBT. ............................. 97 xv LIST OF TABLES A.1 Parameters used for improved N F and N EI temperature mapping mod- els. .................................... 105 A.2 Parameters used for improved E a,true , I S and I BEI temperature mapping models. .................................. 106 A.3 Parameters used for improved I KF temperature mapping model. .... 107 xvi CHAPTER 1 INTRODUCTION AND OVERVIEW SiGe HBTs (heterojunction bipolar transistors), integrated with CMOS, have demon- strated their superior abilities in digital and analog circuit designs for wired and wireless telecommunication applications in recent years. Tremendous advances in fabrication technology have led to the extreme scaling down of devices with corresponding perfor- mance improvements. A 350 GHz peakf T SiGe technology was announced in 2003 [1], that has led to the highest speed yet among current technologies. The rapid development of this technology has made the study of device characteristics and modeling a high pri- ority due to the unpredictable new features that have appeared with this device scaling. Of critical importance to successful circuit design is the ability to implement accurate device compact models, along with a good understanding of internal device character- istics, especially for analog RFIC design. This indicates the need for a detailed study of device characteristics and compact modeling techniques. Another important aspect is the ease of modifying existing device compact models to keep pace with the rapid development of modern technology and deal with the new features that continuously arise with device scaling. This requires an improvement in the language tools used to write portable device compact models that can be used with circuit simulators such as Cadence and Agilent ADS. Moreover, mankind?s exploration of the universe calls for robust circuit designs that will function in the extreme temperature environments found 1 outside the Earth?s atmosphere. Accurate device modeling over a wide temperature range has desperately needed. This thesis investigates both device physics and compact modeling using a new technique ? the Verilog-A based VBIC (Vertical Bipolar Inter-Company) model, which makes a portable device compact model for device simulator that can be easily modified and implemented into circuit simulators without the need to interface with the simula- tors. Moreover, the internal currents, charges, and noise sources are accessible, which is currently not the case for the built-in models used in circuit simulators. Based on the Verilog-A based VBIC model, three applications for SiGe HBT noise modeling and VBIC temperature mapping models are presented. This introductory chapter briefly reviews the basic principles of SiGe HBT, and provides an overview of the thesis. 1.1 Basic Principles of SiGe HBT This section gives a brief overview of the DC and ac performance abilities of SiGe HBTs. Only the final results are included. Detailed derivations can be found in [2]. The fundamental di?erences between the SiGe HBT and Si BJT (bipolar transistor) are emitter-base (EB) and collector-base (CB) Si-SiGe heterojunctions. The essential operational di?erences between SiGe HBT and Si BJT can be illustrated by considering the schematic energy band diagram shown in Fig. 1.1. For simplicity, assume a constant doping in the emitter, base and collector regions. The Ge mole fraction is linearly graded from 0% near the EB junction to some maximum value near the CB junction. This graded Ge profile creates an accelerating electric field in the neutral base. 2 Figure 1.1: Energy band diagram of a graded-base SiGe HBT as compared to an identi- cally constructed Si BJT. Germanium has a bandgap of 0.66 eV, which is considerably smaller than Silicon?s bandgap of 1.12 eV. Hence, SiGe?s bandgap is less than the bandgap of Si and there is a roughly 7.5 meV band o?set per 1% Ge. Adding Ge in the base primarily a?ects the DC performance of SiGe HBT through the collector current density J C , which is pro- portional to the minority carrier (electron) density in the base region. The Ge-induced bandgap o?set exponentially increases the intrinsic carrier density and hence increases the minority carrier density in the base region, leading to an increase in J C . Meanwhile, because the emitter region is the same for both SiGe HBT and Si BJT, the base current density J B is roughly the same. The Gummel curves for a SiGe HBT and a Si BJT are compared in Fig. 1.2. The SiGe HBT and Si BJT have been identically processed to 3 allow unambiguous comparison. The SiGe HBT clearly has a much higher J C than the Si BJT, although it has a similar J B . Accordingly, the DC current gain ?, defined as J C /J B , is much higher in the SiGe HBT than in the Si BJT. Figure 1.2: Comparison of Gummel characteristics of a comparably constructed SiGe HBT and Si BJT. In most RF and microwave circuit applications, it is the transistor frequency re- sponse that limit system performance. An important figure-of-merit in bipolar transistor is the unity gain cuto? frequency f T , which is given by f T = bracketleftbigg 1 g m (C eb +C cb ) +? b +? c +? e bracketrightbigg ?1 (1.1) 4 where g m is the transconductance, C eb and C cb are the EB and CB capacitances and ? b , ? c , ? e are the base, collector and emitter transit times, respectively. Of these three transit times, ? b is the primary portion that limits the maximum f T of a conventional bipolar transistor. The built-in electric field created by the graded Ge content across the neutral base region accelerates the minority carriers across the base region, resulting in a decrease in ? b , and hence higher f T for a SiGe HBT. Fig. 1.3 shows a comparison of the f T performance for a SiGe HBT and a comparably constructed Si BJT. Note that f T is increased from 35 GHz to 50 GHz by introducing a graded Ge mole fraction in the base. Figure 1.3: Measured comparison of unity gain cuto? frequency f T as a function of collector current for a comparably constructed SiGe HBT and Si BJT. 5 A more relevant figure-of-merit for practical RF and microwave applications is the maximum oscillation frequency f max , since it depends on both the f T and the device parasitics. f max is given by f max = radicalBigg 1 8?C cb ? f T r b (1.2) where C cb is the total CB capacitance and r b is the total base resistance. f T /r b ratio needs to be increased to improve f max . For a double contact base, r b is related to the product of base doping N B and base width W B by, r b = 1 12q? p X E L E 1 N B W B (1.3) where X E is the lateral emitter width, L E is the lateral emitter length, and ? p is the majority hole mobility in the base. For a conventional Si BJT, there is a tradeo?between ? and r b due to the base doping. Increasing the level of doping in the base will decrease the minority carrier density in the base, resulting in a decrease in J C and, hence, ?. Meanwhile, to reduce r b , the base doping needs to be increased. With careful bandgap engineering, however, r b can be reduced by decreasing N B without compromising ?, since ? can be increased exponentially by adjusting the Ge-induced bandgap o?set. Moreover, as discussed above, f T is increased by the graded Ge content in the base. As a result, it is possible to increase f T , and reduce r b without sacrificing ? performance, leading to an increase in the f T /r b ratio, and hence improve f max for a SiGe HBT. 6 1.2 Thesis Contributions This thesis presents a new technique for use in investigating device physics and compact modeling using Verilog-A hardware language. This new Verilog-A based model can be easily modified and implemented into circuit simulators without the need to interface with simulators. The internal currents, charges, and noise sources, which are currently not available when existing built-in models are used in circuit simulators, all become accessible using this technique. The Verilog-A Language is introduced in Chapter 2. The essence of using Verilog- A based compact modeling in place of low-level simulator code is explained in detail. An example of Verilog-A based modeling is given to illustrate the use of the Verilog-A language. Chapter 3 introduces the physics behind the VBIC model and the temperature models in VBIC. In Chapter 4, the VBIC model is realized in the new Verilog-A language, and im- plemented into the circuit simulators Cadence and ADS. Several problems such as syn- tax errors, convergence problems and numerical problems were encountered and their solutionis are reported in this chapter. Noise models were added in the Verilog-A based model to be consistent with the Cadence built-in model. The DC,ac, noise and large sig- nal simulation comparisons between Verilog-A based VBIC modeling and the Cadence built-in VBIC model revealed identical results. Based on the new Verilog-A based VBIC model, two applications for SiGe HBTs noise modeling are presented in Chapter 5. First, a new inverse circuit simulation based 7 low frequency noise extraction method is proposed based on the Verilog-A based VBIC model. The low frequency noise of a device biasing at high current can be measured more accurately through this method. Secondly, to better understand the di?erent phase noise upconversion mechanisms of the base current 1/f noise and base current short noise in oscillator design, the internal I BE and the internal I CE were separated from the external I BE and the external I CE using the Verilog-A based VBIC model. Clearly, the noise generating current, I BE , makes up only a small portion of the terminal I B . A group of improved temperature mapping models for modeling of DC currents down to 43 K are presented in Chapter 6. The new VBIC based model was imple- mented using Verilog-A, compiled into binary code, and dynamically linked to a circuit simulator (ADS) through its compact modeling interface. Excellent Gummel and output fitting across a wide temperature range from 300 K down to 43 K were achieved for a 50 GHz SiGe HBT device. Intermodulation linearity that relates to the selectivity of an RF receiver is another important figure-of-merit for SiGe HBTs. In Chapter 7, the intermodulation linearity simulation capability of the VBIC, HICUM and Mextram models is evaluated using harmonic balance in a 200 GHz SiGe HBT device and the impact of avalanche and self-heating on IIP3 are discussed. A weak avalanche was shown to have a significant impact on IIP3 and the results provide new insights into the device physics underlying the linearity behavior and quantified simulation data for comparisons of linearity that will be useful for both designers and modelers. Chapter 8 presents the major conclusions of this work. 8 Appendix A presents the code for the new Verilog-A based VBIC model, along with a group of improved temperature mapping models for modeling DC currents down to 43 K. 9 CHAPTER 2 VERILOG-A LANGUAGE In most circuit simulators, compact models such as the built-in model are embed- ded in the simulators and serve as the basic simulation function components. Mean- while, the interfaces in the compact model define its connections with the simulators and the analysis engine. As a consequence, an in-depth understanding of simulator ar- chitecture and analysis engine is a basic requirement for model developers due to the complexity involved, which extends far beyond the model descriptions. Moreover, any changes in the models will require lengthy, recompilation and re-linking to the SPICE program, which in turn increases the model implementation process period and reduces the number of choices for end users. In addition, these kind of models are not portable for use in di?erent simulators as a result of their own di?erently compiled model inter- faces. C (Spice3) programming has been the standard language for most compact models used in circuit simulators since 1985 because of its flexibility and ease of compilation for the simulators. However, writing the model source code is still a lengthy task. For example, the BSIM4 model requires over 20k lines and could take an experienced engi- neer months to write and debug. 10 2.1 Introduction of Verilog-A Verilog-A (one of the subsets of Verilog-AMS), is derivated from IEEE 1364-1995 Verilog HDL and is an IEEE standard analog hardware description language that uses modules to describe the structure and behavior of analog systems and their components for multi-domain simulations (electrical, thermal, and mechanical). With the release of the Verilog-AMS Language Reference Manual (LRM) version 2.2 by Accellera on February 14, 2005 [3], many new features were added, making it possible to easily de- velop new compact models for semiconductor devices such as transistors and diodes in a standard language. Today, Verilog-A is widely accepted as a more powerful, portable, suitable, and flexible language for compact model description. Specialized features are provided by Verilog-A to create and use modules that en- capsulate high-level behavioral descriptions of systems and components [3]: ? Verilog-A modules are compatible with Verilog-AMS HDL. ? Analog behavioral modeling descriptions are contained in a separate analog block. ? Branches can be named for easy selection and access. ? Parameters can be specified with valid range limits. ? Systems can be modeled by using expressions consisting of operators, variables, and signals, including: ? a full set of operators including trigonometric functions, integrals, and deriva- tives; 11 ? a set of waveform filters to modify the waveform results for faster and more accurate simulations, such as transition, slew, Laplace, and Z-domain; ? a set of events to control when a certain code is simulated; ? selection of the simulation time step for simulation control; and ? support for accessing SPICE primitives from within the language. The major reason for choosing Verilog-A as a standard language for the compact model is to avoid the need for complex interfaces in the circuit simulators [4]. With the development of the modern semiconductor manufacturing processes, the period re- quired for new device releases is becoming shorter and shorter, and the geometries of the devices themselves are becoming smaller and smaller. The new equations written in C for the new physical e?ects need to be installed into the circuit simulators in a very short time. However, the simulator interface, which includes various functions such as topology checking, parameter reading, Jacobian matrix and current vectors loading, and value initializing, presents a significant barrier for model developers [4] [5]. Nor- mally, an in-depth understanding of interfaces is more di?cult than the description of the compact model, resulting in a slowdown when adopting a new model process. Since Verilog-A is a simulator-independent standard language, the model developers no longer need to deal with these specific details. Moreover, Verilog-A is a higher-level language than the C programming language. For example, the symbolic partial derivations of the charges and currents in compact models can be automatically computed by Verilog-A simulators. Traditionally, partial 12 derivatives of the equations in a compact model for the Newton-Raphson algorithm need to be written in the C programming language in circuit simulators. From a device research standpoint, an important benefit of Verilog-A based com- pact modeling is that users can access the internal currents, charges, and noise parame- ters which cannot be modified in the built-in models traditionally used in circuit simu- lators such as Spectre and ADS. This makes it possible for individuals or small research groups to develop and modify a compact model according to their specific research objectives. Three important applications based on a Verilog-A VBIC model will be introduced in chapters 5 and 6. 2.2 Verilog-A basics As an e?cient language for writing compact models, Verilog-A is both simple and easy to learn. As mentioned previously, Verilog-A uses modules to describe the structure and behavior of analog systems and their components. Here, the module can be described mathematically by its terminals and external parameters. Both electrical and non-electrical system descriptions can be used with Verilog-A. The concepts of nodes, branches, and terminals are provided to support the conservative and signal-flow descriptions. In addition, Kirchho??s Potential and Flow Laws (KPL and KFL) are obeyed in the analog behavior solutions, and defined by the quantities associated with the analog behaviors. 13 2.2.1 Example: Simple Diode Diode Model Equations The example of a simple junction diode will provide a better understanding of the utility of Verilog-A. Fig. 2.1 shows the equivalent circuit of a junction diode used in this example. Here, only a brief discussion regarding the usage of Verilog-A is given. For more detailed description, please refer to [3] [5] and [6]. int a c G min i d q d V id R S Figure 2.1: Equivalent circuit of junction diode. A single linear resistor R S represents both the external contact resistance and any voltage drop in the neutral n and p regions. The voltage drop in the neutral regions is significant under a high level injection condition. G min is the minimum conductance, which is a constant selected for numerical reasons. The dc characteristic of the device 14 is modeled by a nonlinear current source i d with the ideal diode equation i d = i s exp parenleftbigg V id nV T ? 1 parenrightbigg (2.1) where i s is the saturation current, V T = kT is the thermal voltage, n is the emission coe?cient, and V id is the intrinsic voltage between nodes int and c. The charge storage element q d in Fig. 2.1 models both the di?usion charge storage by injected minority carriers and the charge stored in the depletion region. The total charge q d is given by q d = q di? +q j (2.2) q di? is the di?usion charge, which depends on the transit time parameter tt, q di? = i d tt (2.3) with a di?usion capacitance c di? (V ), c di? (V ) = dq di? dV = 1 nV T i d tt. (2.4) q j is the stored charge in the depletion region, q j = integraldisplay V id 0 c j (V )dV (2.5) 15 where c j (V ) is the junction capacitance. Substituting (2.3) and (2.5) into (2.2), we have q d = i d tt+ integraldisplay V id 0 c j (V )dV (2.6) Assuming an abrupt junction, c j (V ) is: c j (V ) = c j0 radicalBig 1 ? V id ? (2.7) where c j0 is zero voltage junction capacitance, and ? is the built-in potential. However, (2.7) has numerical problems at V id ? ?, and c j (V ) is not continuous at V id = ?.To solve this discontinuity problem, a factor f c is introduced: 0 1.0e-6 ? 1/rs : 1.0e6; expi = limexp(V(v_id)/(n*$vt)); vmax = n*$vt*ln(imax/is+1); if (V(v_id) < vmax) begin id = is*(expi-1); end else begin id = imax+(V(v_id)-vmax)*(imax+is)/(n*$vt); end if (V(v_id)) > imelt) $strobe( "Warning: diode is melting!" ); end endmodule disciplines is used for definitions of related physical signal types, variables, and absolute tolerance, which can be defined by users. This file can be loaded into model de- scriptions by the command ?include. Basic physical quantities such as units, expected quantity size, and access name are described in disciplines. constants.vams is used to define the mathematical and physical constants necessary for the descriptions involved in device modeling. ?define is used for text macro substitution, which allows meaningful names to be used to present commonly used pieces of text. It can be used both inside and outside module definitions. As a basic building block, a Verilog-A module describes the individual compo- nents, and can be instantiated into a netlist of circuit simulators. The module name diode is followed by the ports (a, c), which are used for component connection. The port direction is declared by inout, which indicates the signal flow. For the compact 19 model, the port type electrical is defined by the disciplines file, where the signal associated with the ports is declared in terms of its variable voltage and variable current. branch is a new statement and represents an explicit term in model descriptions. A branch is a path between two nets. Two branches, v_rs and v_id, are declared in this example. The branch declaration statement can be directly used for current and voltage descriptions and to simplify model descriptions. parameter is used for parameter declaration and should follow the port statement. The default value should be given and can be re-specified when the module is instanti- ated. real defines the type of parameters, although this is optional. Sometimes range limits are used to specify that the parameters fall within a particular range and may be used to avoid non-theoretical values or mathematical calculation errors. Here, the parentheses () exclude the endpoints while the brackets [] include the endpoints, and exclude indicates that it must not include the endpoints. If the specified value is out of range when the module is instantiated, the simulator will automatically generate an error message. The realstatement, which represents a real physical connection between structural entities, declares id to be a real variable. It should not store its value. For an analog process, the real net is associated with a continuous time kernel and is always initialized to zero. It can only be connected to a compatible interconnect and other real expressions. The expression rs>1.0e-6 ? 1.0/rs : 1.0e6 is used for conditional opera- tion. If rs>1.0e-6 evaluates as false, then 1.0e6 is used as the result of the conditional expression; if rs>1.0e-6 evaluates as true, 1.0/rs is used as the result. 20 The analog block is used to describe the behavior of the module. Delimited by the keywords begin and end, statements which are used to describe the relationship of signals in an analog block can be grouped together and executed sequentially in a given order. Only one analog block can be used in each module. Analog conditional statements such as if-else are used to determine whether a statement should be executed or not. The terms GMIN and imax are used to aid conver- gence and prevent numerical overflow during iterations in simulation. The term imelt is used as a limit warning for the junction current. The branch contribution operator <+ is used in statement to describe analog behav- ior. It can only be used in an analog block. A branch contribution statement is separated by a branch contribution operator into two parts, a left side and a right side. In gen- eral, the right side can be any expression which evaluates to or can be promoted to a real value. The left side specifies the source branch signal where the right side is to be assigned. The symbol $ serves as a system function or system task indicator. It is often used in environment parameter functions. For example, the simulation temperature is defined as $temperature, which does not take any input arguments and returns the circuit?s ambient temperature in Kelvin units, and the thermal voltage is represented by $vt. The operators + - * / and functions sqrt, pow, ln, exp, and abs are available in Verilog-A. In general, the operator limexp is used instead of exp to obtain better conver- gence in a semiconductor compact model. The charge time-derivation operator function ddt is used for capacitive current. The noise sources are described by white_noise 21 and flicker_noise, which generate white noise and pink noise, respectively. The term ?P_Q is included in the constants.vams file. The <> is used to delimit the port name. The I() used here presents the accessing current that passes through module port a. The $strobe term is used to display simulation data or print a newline character when the simulator has converged on a solution for all nodes. The endmodule keyword is used when the module definition is complete. Simulation Results A voltage V d is applied between nodes a and c. The simulated Diode I d ?V id and I d ?V d curves are shown in 2.2. 0 0.2 0.4 0.6 0.8 1 10 ?10 10 ?5 10 0 V id , V d (V) I d (mA) I d vs V id I d vs V d V d = R S ? I d + V id R S = 1 ? Figure 2.2: Simulated Diode I d ?V id and I d ?V d curves. 22 0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0 0.2 0.4 0.6 0.8 x 10 ?14 V id (V) Charges (C) total q d = q diff + q j q diff q j f c = 0.9 ? = 0.7 V (a) 0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0 0.2 0.4 0.6 0.8 x 10 ?14 V id (V) Capacitances (F) total C diff + C j C j C diff f c = 0.9 ? = 0.7 V C j0 (b) Figure 2.3: (a) Simulated Diode q d , q di? , and q j vs V id . (b) Extracted Diode C ? V curves. 23 q d , q di? , and q j vs intrinsic voltage V id are shown in Fig. 2.3 (a). The extracted C V curves are shown in Fig. 2.3 (b). Note that both c j and q j are continuous at V id = ?. 2.3 Summary This chapter introduced the Verilog-A Language. The use of a Verilog-A based compact modeling in place of low-level simulator code was explained in detail. Fi- nally, an example of Verilog-A based modeling was given to demonstrate the use of the Verilog-A programming language. 24 CHAPTER 3 VBIC MODELING The SPICE Gummel-Poon (SGP) model has been the IC industry standard for mod- eling bipolar junction transistors (BJT) for almost thirty years. However, the Gummel- Poon model is unable to model collector resistance modulation (quasi-saturation) and parasitic substrate transistor action, and is not adequate to model modern HBT (het- erojunction bipolar transistor) devices due to the high speed and accurate simulation requirements for the modern telecommunication industries, especially for RF design. An improved VBIC (Vertical Bipolar Inter-Company model) was introduced by IC and CAD industry representatives in 1995 and is widely used. VBIC is based on the SPICE Gummel-Poon model, with a modified version of the Kull-Nagel quasi-saturation model. The main improvements in VBIC compared to SGP [7] include: ? a modified form is used in Early e?ect (g o ) modeling to better describe the output conductance of the bipolar transistor, ? an improved quasi-saturation modeling process is implemented to avoid a nega- tive value for the output conductance, ? parasitic substrate PNP transistor modeling, ? parasitic fixed (oxide) capacitance modeling, ? avalanche multiplication modeling, 25 ? improved temperature dependence modeling, ? decoupling of base and collector currents, ? electrothermal (self heating) modeling, ? C ? continuous (smooth) modeling, ? improved HBT modeling. VBIC is used particularly for 4-terminal vertical NPN transistors. For 5-terminal vertical PNP transistors in smartpower technologies, VBIC can be treated as a subcircuit. However, the geometry scaling cannot be taken into account in VBIC because of the plethora of BJT structure and layout considerations. Fig. 3.1 shows an equivalent network for VBIC, which includes an intrinsic NPN transistor (the same equivalent circuit used in the standard Gummel-Poon model), a parasitic PNP transistor, and parasitic resistances and capacitances. The external local thermal network is used only with the electrothermal version of the model. It is com- posed of a thermal resistance R th , a thermal capacitance C th , and a thermal source (heat generation) I th which can model the thermal properties of a BJT transistor by connecting to the local heating and power dissipation in the device. The excess phase for forward transport current I tzf is also considered in another separate external subcircuit. In this thesis, only a brief discussion on VBIC modeling is provided. For a more detailed model description, please refer to [7] and [8]. 26 Figure 3.1: VBIC equivalent network 27 3.1 Modeling of Transfer Current The band diagram of an intrinsic bipolar transistor is shown in Fig. 3.2. Nodes bi, ei, and ci are the internal nodes shown in Fig. 3.1. V BEI is the intrinsic BE forward bias voltage between nodes bi and ei. V BCI is the intrinsic BC forward bias voltage between nodes bi and ci. At zero bias, i.e., V BEI = 0 and V BCI = 0, the neutral base region starts at 0, and ends at W p . The quasi-Fermi level of the electrons E fn is flat, and equal to the quasi-Fermi level of the holes E fp , as shown in Fig. 3.2 (a). When a forward bias V BEI is applied to the internal device, the EB junction depletion width is shortened. The left edge of the quasineutral base region moves from 0 to x1, as shown in Fig. 3.2 (b). Similarly, the right edge of the quasineutral base region moves from W p to x2 when a forward bias V BCI is applied to the CB junction. x2 ?x1 gives the width of the quasineutral base region. As the recombination is negligible in a narrow base, the electron current density in the base region can be written as, J n = n? n dE fn dx (3.1) where n is the electron concentration, and ? n is the electron minority carrier mobility. The hole quasi-Fermi level E fp can be assumed to be constant, since dE fp dx = J p p? p ? 0 (3.2) 28 bi ei ci E B C 0 W p E C E V E Fn E Fp (a) V BEI = 0 V BCI = 0 E Fn bi ei ci E B C x1 x2 E C E V E Fn E Fp (b) E Fn E Fn V BEI > 0 V BCI > 0 qV BEI qV BCI Figure 3.2: Band diagram of an intrinsic bipolar transistor. (a) V BEI = 0, V BCI = 0; (b) V BEI > 0, V BCI > 0. 29 where p is the majority hole concentration in the base, which is very large. ? p is the hole majority carrier mobility, and J p is the hole current density in the base region. The np product is E fn ?E fp = kT ln parenleftbigg np n 2 i parenrightbigg (3.3) where k is Boltzmann?s constant, T is temperature in degrees Kelvin, and n i is the e?ective intrinsic concentration. From (3.1), (3.2) and (3.3), J n can be rewritten as J n = n? n d(E fn ?E fn ) dx (3.4) = qD n n 2 i p d dx parenleftbigg np n 2 i parenrightbigg (3.5) where q is the magnitude of the electronic charge and the electron di?usivity D n is related to the electron mobility ? n through the Einstein relations, D n = ? n kT/q. Electrons, injected from the emitter into the base, reach the collector and become the collector current. Moving qD n n 2 i p in (3.5) to the left-hand side gives J n p(x) qD n n 2 i dx = d parenleftbigg np n 2 i parenrightbigg (3.6) Integrating on both sides gives J n integraldisplay x2 x1 p(x) qD n n 2 i dx = np n 2 i vextendsingle vextendsingle vextendsingle vextendsingle x2 ? np n 2 i vextendsingle vextendsingle vextendsingle vextendsingle x1 (3.7) 30 The boundary conditions for EB and CB junctions are np n 2 i vextendsingle vextendsingle vextendsingle vextendsingle x1 = exp parenleftbigg V BEI V T parenrightbigg (3.8) np n 2 i vextendsingle vextendsingle vextendsingle vextendsingle x2 = exp parenleftbigg V BCI V T parenrightbigg (3.9) where V T = kT/q is the thermal voltage. Applying these boundary conditions gives J n integraldisplay x2 x1 p(x) qD n n 2 i dx = ? bracketleftbigg exp parenleftbigg V BEI V T parenrightbigg ? exp parenleftbigg V BCI V T parenrightbiggbracketrightbigg (3.10) Note that the negative value for J n indicates that the electrons are flowing towards the collector. Let Q B = q integraldisplay x2 x1 p(x)dx (3.11) which represents the total majority charge per unit area in the base. Assuming D n and n 2 i are position independent, (3.10) can then be rewritten as J n = ? q 2 D n n 2 i Q B bracketleftbigg exp parenleftbigg V BEI V T parenrightbigg ? exp parenleftbigg V BCI V T parenrightbiggbracketrightbigg (3.12) Defining Q B0 as the Q B at zero applied voltage, i.e., V BEI = 0, V BCI = 0, Q B0 = q integraldisplay W p 0 N B (x)dx (3.13) 31 The Q B /Q B0 ratio is denoted as q b , which represents the normalized base charge. Then (3.12) can be rewritten as J n = J S q b bracketleftbigg exp parenleftbigg V BEI V T parenrightbigg ? exp parenleftbigg V BCI V T parenrightbiggbracketrightbigg (3.14) J S = q 2 D n n 2 i Q B0 (3.15) where J S is the saturation current density. The simple theory discussed above shows that the forward collector current is ex- ponentially related to the inverse thermal voltage. Empirically, however, a non-ideality factor N F must be introduced to numerically describe the nonideal e?ect induced by the spatial coordinate dependence of mobility, doping concentration, di?usion constant, and carrier lifetimes. Similarly, a non-ideality factor N R is used for the reverse collector current. Therefore the final collector current is I C = A E |J n | = I tf ?I tr q b (3.16) I tf = I S bracketleftbigg exp parenleftbigg V BEI N F V T parenrightbigg ? 1 bracketrightbigg (3.17) I tr = I S bracketleftbigg exp parenleftbigg V BCI N R V T parenrightbigg ? 1 bracketrightbigg (3.18) I S = A E J S (3.19) where I tf and I tr are the forward and reverse transport currents. A E is the emitter area, and I S represents the saturation current. 32 Moving on to examine the normalized base charge q b , p(x) in the base has three components: the base doping N B (x),n be (x) due to EBapplied voltage V BEI , and n bc (x) due to CB applied voltage V BCI , p(x) = N B (x) +n be (x) +n bc (x) (3.20) Therefore, Q B changes with applied voltages V BEI and V BCI in several ways: 1. x1 changes withV BEI , causing extra depletion charge ofQ JE as shown in Fig. 3.3, corresponding to the reverse Early E?ect. Q JE = integraldisplay 0 x1 qN B (x)dx (3.21) 2. x2 changes withV BCI , causing extra depletion charge ofQ JC as shown in Fig. 3.3, corresponding to the forward Early E?ect. Q JC = integraldisplay x2 W p qN B (x)dx (3.22) 3. n be (x) changes with V BEI , corresponding to the di?usion charge Q ne . Q ne = integraldisplay x2 x1 qn be (x)dx vextendsingle vextendsingle vextendsingle vextendsingle V BEI >0,V BCI =0 (3.23) 33 N B (x) xx2 x1 0 W p Q B0 Q JC Q JE V BEI 0 0 V BCI >0 >0 Figure 3.3: Zero bias charge Q B0 , EB depletion charge Q JE , and CB depletion charge Q JC in the neutral base region. 4. n bc (x) changes with V BCI , corresponding to the di?usion charge Q nc . Q nc = integraldisplay x2 x1 qn bc (x)dx vextendsingle vextendsingle vextendsingle vextendsingle V BEI =0,V BCI >0 (3.24) The total base charge Q B is the sum of Q B0 , Q JE , Q JC , Q ne , and Q nc : Q B = integraldisplay x2 x1 (N B (x) +n be (x) +n bc (x))dx (3.25) = Q N B +Q ne +Q nc (3.26) Q N B = integraldisplay x2 x1 N B (x)dx (3.27) 34 Q N B = integraldisplay 0 x1 N B (x)dx+ integraldisplay W p 0 N B (x)dx+ integraldisplay x2 W p N B (x)dx, (3.28) = Q JE +Q B0 +Q JC . (3.29) Therefore q b can be written as q b ? = Q NB Q B0 + Q ne Q B0 + Q nc Q B0 (3.30) = q 1 + Q ne Q B0 + Q nc Q B0 (3.31) and q 1 ? = Q NB Q B0 (3.32) ? = 1 + Q JE Q B0 + Q JC Q B0 (3.33) q 1 is a function of bias, and represents the normalized base charge under the low level injection conditions, where Q ne Q B0 lessmuch 1 and Q nc Q B0 lessmuch 1, and hence q b ? q 1 . In practice, it is not possible to directly determine Q JE and Q JC . Instead the EB and CB depletion capacitances are given as C je (V ) = dQ JE dV BEI (3.34) C jc (V ) = dQ JC dV BCI (3.35) 35 Therefore, (3.33) can be rewritten as q 1 = 1 + 1 Q B0 integraldisplay V BEI 0 C je (V )dV + 1 Q B0 integraldisplay V BCI 0 C jc (V )dV (3.36) Let C JE = C je (0), and C JC = C jc (0). Define the reverse Early voltage V ER and the forward Early voltage V EF as V ER ? = Q B0 C JE (3.37) V EF ? = Q B0 C JC (3.38) Therefore, (3.36) can be rewritten as, q 1 = 1 +q je +q jc (3.39) q je = 1 V ER 1 C JE integraldisplay V BEI 0 C je (V )dV (3.40) q jc = 1 V EF 1 C JC integraldisplay V BCI 0 C jc (V )dV (3.41) However, in VBIC modeling, V ER and V EF are treated as completely independent pa- rameters for flexibility in fitting data. Moreover, V ER C JE does not necessarily equal V EF C JC in real device model parameters. At high injection, the di?usion charges Q ne and Q nc are important. Assuming the transit time? associated with each di?usion charge remains the same as for low injection 36 Q ne = I tf ? f q b (3.42) Q nc = I tr ? r q b (3.43) where ? f and ? r are the forward and reverse transit time, respectively. Now (3.31) can be rewritten as q b = q 1 + I tf ? f q b Q B0 + I tr ? r q b Q B0 (3.44) = q 1 + q 2 q b (3.45) and q 2 ? = I tf ? f Q B0 + I tr ? r Q B0 (3.46) Further assuming ? f and ? r are independent of bias, the forward Knee current I KF and reverse Knee current I KR can be defined as, I KF = Q B0 ? f (3.47) I KR = Q B0 ? r (3.48) 37 Then (3.46) is rewritten as q 2 ? = I tf I KF + I tr I KR (3.49) Solving (3.45) gives q b in terms of q 1 and q 2 ,so q b = 1 2 bracketleftbigg q 1 + radicalBig q 2 1 + 4q 2 bracketrightbigg (3.50) In summary, the equations for transfer current are: I C = A E |J n | = I tf ?I tr q b (3.51) I tf = I S bracketleftbigg exp parenleftbigg V BEI N F V T parenrightbigg ? 1 bracketrightbigg (3.52) I tr = I S bracketleftbigg exp parenleftbigg V BCI N R V T parenrightbigg ? 1 bracketrightbigg (3.53) q b ? = 1 2 bracketleftbigg q 1 + radicalBig q 2 1 + 4q 2 bracketrightbigg (3.54) q 1 = 1 +q je +q jc (3.55) q je = 1 V ER 1 C JE integraldisplay V BEI 0 C je (V )dV (3.56) q jc = 1 V EF 1 C JC integraldisplay V BCI 0 C jc (V )dV (3.57) q 2 ? = I tf I KF + I tr I KR (3.58) 38 3.2 Modeling of Internal EBand BC Diodes The internalEBdiode is more complicated in the VBIC model than that in Gummel- Poon model because of the need to introduce additional emission coe?cients. The ideal base current and nonideal current are included in the internal EB diode by I bt = I BE +I BEX (3.59) = I BEI bracketleftbigg exp parenleftbigg V BEI N EI V T parenrightbigg ? 1 bracketrightbigg +I BEN bracketleftbigg exp parenleftbigg V BEX N EN V T parenrightbigg ? 1 bracketrightbigg (3.60) The ratio between I BE and I BEX is defined by parameter W BE . The current in the internal BC diode can be written as I bc = I BCI bracketleftbigg exp parenleftbigg V BCI N CI V T parenrightbigg ? 1 bracketrightbigg +I BCN bracketleftbigg exp parenleftbigg V BCX N CN V T parenrightbigg ? 1 bracketrightbigg (3.61) A weak avalanche current source I gc , modeled by the formula of Klosterman and de Graa?, is also included in the BC diode, I gc = (I cc ?I bc )A VC1 (P C ?V BCI )exp bracketleftbig ?A VC2 (P C ?V BCI ) M C ?1 bracketrightbig (3.62) The excess phase is modeled in the external subcircuit of Fig. 3.1 for both ac and transient analyses. If the capacitance of Q cxf and the inductance of F lxf are assumed to be C and L, respectively, the voltage V xf2 across the 1 ? resistance caused by the 39 controlled current source I tf can be written as V xf2 = 1 1 +j?RC ?? 2 LC (3.63) where L = T D /3, C = T D , and T D = 1/? 0 . The current I xf2 flows through R and produces a voltage, which can be used to describe the delay in the voltage response of the transfer current. 3.3 Modeling of Quasi-Saturation The voltage drop across the collector resistance, which includes the resistance formed by the undepleted portion of the epilayer, the subcollector and the collector contact, decreases the potential di?erences across the CB space charge layer, resulting in an increase in the base width and, hence, the base transit time and may even cause the BC diode to be internally forward biased. This phenomena is called the quasi-saturation e?ect. Using a modified version of the Kull model, the quasi-saturation e?ects are in- cluded in the modeling of the intrinsic collector (epi) region to avoid producing a nega- tive value for g o at high V BE . If the velocity saturation is ignored, the current in the epi layer is written as I epi0 = V rci +V T bracketleftBig K bci ?K bcx ? ln parenleftBig K bci +1 K bcx +1 parenrightBigbracketrightBig R CI (3.64) 40 where K bci = bracketleftbigg 1 +? exp parenleftbigg V BCI V T parenrightbiggbracketrightbigg 1/2 (3.65) K bcx = bracketleftbigg 1 +? exp parenleftbigg V BCX V T parenrightbiggbracketrightbigg 1/2 (3.66) Moreover, an alternative velocity saturation model is introduced, ? = ? 0 /[1 + (? 0 ?? e /v sat ) 2 ] 1/2 (3.67) Meanwhile, converting V rci into I epi0 R CI , the current across R CI becomes I rci = ? ? ? ? ? ? ? ? ? I epi0 ? ? 1 + I epi0 R CI V O parenleftbigg 1+ 0.5(V 2 rci +0.01) 1/2 V O H RCF parenrightbigg ? ? 2 ? ? ? ? ? ? ? ? ? 1/2 (3.68) where H RCF is a dimensionless fitting parameter that allows one to partially replace V O by V RCI . 3.4 The Parasitic PNP Transistor For the npn bipolar device with a p-type substrate, the parasitic vertical pnp transis- tor formed by the BC and CS junctions can be modeled by a simplified Gummel-Poon 41 equivalent circuit. The forward current can be written as I tfp = I SP bracketleftbigg W SP exp parenleftbigg V BEP N FP V T parenrightbigg + (1?W SP )exp parenleftbigg V BCI N FP V T parenrightbigg ? 1 bracketrightbigg (3.69) The normalized base charge of the parasitic transistor only comprises high-level injec- tion e?ects, as the Early e?ect can be neglected, so q bp = 1 + q 2p q bp (3.70) q 2p = I tfp I KP (3.71) The parasitic base currents are then modeled similar to the internal EB base current. 3.5 Temperature Mapping The temperature e?ects of saturation currents, current gains, serious resistances, and depletion capacitances in BJT are all modeled in the VBIC model. 3.5.1 Resistance The temperature dependence of the series resistances is modeled as: R X (T) = R X (T nom ) parenleftbigg T T nom parenrightbigg X RX (3.72) Here, X RX is di?erent for the emitter, base, collector and substrate resistances. 42 3.5.2 Capacitance The temperature dependence of zero-bias depletion capacitances is modeled as: C X (T) = parenleftbigg P X (T) P X (T nom ) parenrightbigg M X (3.73) where M X denotes the grading exponent of the corresponding junction. The built-in voltage P X is modeled by a temperature-dependent function derived from P X = V T parenleftbigg n n0 p p0 n 2 ie parenrightbigg (3.74) 3.5.3 Knee current I KF The Knee current I KF was originally used as the onset of the high injection e?ect in the base, but in the VBIC model it is used as an empirical parameter. The temperature dependence of the Knee current I KF is modeled as: I KF (T) = I KF (T nom ) parenleftbigg T T nom parenrightbigg X IKF (3.75) where X IKF is the temperature coe?cient for I KF . 43 3.5.4 Ideality Factor N F N F is the ideality factor for the collector current I C . The temperature dependence of N F is modeled as: N F (T) = N F (T nom ) parenleftbig 1 +T nf d T parenrightbig (3.76) where T nf is the temperature coe?cient for N F . d T = T ?T nom . 3.5.5 Saturation Current I S From (3.15) and (3.19), assuming that freezeout does not occur,Q B0 is independent of temperature and the saturation current I S is I S (T) = A E q 2 D n (T)n 2 i (T) Q B0 (3.77) At the reference temperature T nom , I S (T nom ) = A E q 2 D n (T nom )n 2 i (T nom ) Q B0 (3.78) which becomes I S (T) = I S (T nom ) D n (T) D n (T nom ) n 2 i (T) n 2 i (T nom ) (3.79) = I S (T nom ) T T nom ? n (T) ? n (T nom ) n 2 i (T) n 2 i (T nom ) (3.80) 44 Since n 2 i is proportional to T ? exp parenleftBig ? E g (T) kT parenrightBig , and ? n is proportional to T ?m , (3.80) can be rewritten as I S (T) = I S (T nom ) parenleftbigg T T nom parenrightbigg ?+1?m exp parenleftbigg ? E g (T) kT + E g (T nom ) kT nom parenrightbigg (3.81) = I S (T nom ) parenleftbigg T T nom parenrightbigg X TI exp parenleftbigg ? E g (T) kT + E g (T nom ) kT nom parenrightbigg (3.82) where E g is the bandgap energy, andX TI = ? + 1 ?m. Assuming linear T dependence of E g (T), E g (T) = E g (0) ??T (3.83) Thus, ? E g (T) kT + E g (T nom ) kT nom = ? 1 kT parenleftbigg E g (0) ??T ? (E g (0) ??T nom ) T T nom parenrightbigg (3.84) = ? 1 kT E g (0) parenleftbigg 1 ? T T nom parenrightbigg (3.85) Substituting (3.85) in (3.82) gives I S (T) = I S (T nom ) parenleftbigg T T nom parenrightbigg X TI exp bracketleftbigg ? 1 kT E a parenleftbigg 1 ? T T nom parenrightbiggbracketrightbigg (3.86) E a = E g (0) (3.87) 45 The general temperature dependence of saturation currents is therefore modeled in VBIC as: I X (T) = I X (T nom ) parenleftbigg T T nom parenrightbigg X X /N X exp bracketleftbigg ? E X N X V T parenleftbigg 1 ? T T nom parenrightbiggbracketrightbigg (3.88) The temperature variation of the current gain is directly determined by the temperature dependences of the saturation currents. The thermal network in Fig. 3.1 can be used to calculate the excess temperature due to the power dissipated in the device. 46 CHAPTER 4 VERILOG-A IMPLEMENTATION The Verilog-A language and VBIC model have been introduced in Chapter 2 and Chapter 3. In this chapter, the VBIC model is reframed in Verilog-A language, and im- plemented into two circuit simulators, Cadence and ADS. The major problems such as syntax errors, convergence problems and numerical problems, are solved. The DC, ac, noise and large signal simulation comparisons between Verilog-A based VBIC modeling and the Cadence built-in VBIC model show identical results. 4.1 Basic code description The Verilog-A code, based on VBIC version 1.2, used in this thesis can be down- loaded from several open source websites [9] [10] [11] and was automatically generated from special code. The four terminal mode was chosen to ensure consistency with the IBM design kit used in this work. The Verilog-A based VBIC code includes the basic node definitions, branch defi- nitions, parameter definitions, temperature mappings, electrical branch constituent rela- tions, and branch contributions for the VBIC model. The thermal network and excess phase network are also included. The major improvements introduced in the version 1.2 Verilog-A based VBIC code compared to previous versions include: 47 ? base-emitter breakdown model added ? bug in built-in potential fixed ? smooth depletion capacitance model re-parameterized ? separate temperature dependencies added for all resistances and I SP ? temperature dependence added for I KF ? reach-through voltage for C bc limiting added ? ability to separately control saturation currentI S in reverse operation (GaAs/AlGaAs HBTs) ? only one thermal node is used, and tl was dropped (this was deemed unnecessary as it was never used in implementations) ? reference directions of current sources in thermal end excess-phase networks were changed, to be from node to ground (for Verilog-A compatibility) ? transport current explicitly separated into forward and reverse components, for convenience and compatibility of code between constant and excess-phase ver- sions ? N KF parameterization of forward beta rollo? added ? ability to switch to SGP base charge formulation added (Q BM ) 48 4.2 Implementation into Simulators 4.2.1 Implementation into Agilent ADS In Agilent ADS, a directory called veriloga was created for the current project, and the Verilog-A module was placed in that directory [12]. The Verilog-A module can be instantiated as a symbol using the ?User Compiled Models?, which is a function provided in ADS. The Verilog-A compiler in ADS, developed by Tiburon Design Au- tomation, then automatically compiles all Verilog-A files in the ADS Project veriloga directory into simulator. This compiler-based solution results in a simulation time for the Verilog-A based models that is comparable to that of the built-in models. 4.2.2 Implementation into Cadence The same Verilog-A VBIC model code used in ADS can also be implemented into Cadence. In Cadence, a Verilog-A module can be created using the Verilog-A editor without modifying the interface between the internal compact model and the simula- tor [13]. The newly created Verilog-A module can then be instantiated into the simula- tor, and added into the new schematic window as a symbolic view instance. Here, the Verilog-A based VBIC model code was implemented into Cadence in the same way. The discussions in the following sections in this chapter are all based on the Verilog- A based VBIC code implemented in Cadence. 49 4.3 Main debugging issues Since the Verilog-A based VBIC code downloaded from open websites is automat- ically generated from special code, it could not be directly used in Cadence and ADS due to syntax errors. Moreover, the convergence problems induced by numerical issues had to be considered in common Verilog-A based model coding. The main debugging procedures involved were as follows. 4.3.1 Syntax Errors Cadence does not support the symbol $limexp, which is defined in the Verilog-A VBIC code in order to achieve better convergence. Consequently, all the syntax errors due to $limexp had to be corrected to limexp. For instance, the Verilog-A equation for the forward transit time tff is defined as: tff=TF*(1.0+QTF*q1)*(1.0+XTF*$limexp(V(bci)*IVTF/1.44) *(slTF+mIf*mIf)*sgIf); For this project, it had to be modified to: tff=TF*(1.0+QTF*q1)*(1.0+XTF*limexp(V(bci)*IVTF/1.44) *(slTF+mIf*mIf)*sgIf); The module name vbic in Verilog-A VBIC code also conflicts with the primitive definition in Cadence, causing a name duplication in the primitive VBIC. It was there- fore corrected to vbicfinal. 50 4.3.2 Convergence Problems Once the syntax errors had been dealt with, the Verilog-A based model was imple- mented into Cadence. However, the DC and ac simulations su?ered from convergence problems, especially for the large signal simulations. Since the high level Verilog-A description had to be automatically converted to low level simulator code, junction lim- iting and linearization of exponentials must be explicitly handled to aid convergence and prevent numerical overflow [14]. The simulator global parameters gmin, imax, and imelt set the limitation of the diode-like branch current level. The main purpose of explicitly adding these global parameters was to help with convergence. They also solved the ambiguity problem induced by the linearization scheme in the limexp function [14]. The gmin related current in the Verilog-A code was therefore added in each diode-like branch as follows: Ibe = Ibe + gmin * V(bei); Ibex = Ibex + gmin * V(bex); Ibep = Ibep + gmin * V(bep); Ibc = Ibc + gmin * V(bci); Ibcp = Ibcp + gmin * V(bcp); where gmin= 1.0e-12. imax is the branch current threshold. If imax is exceeded during iterations, the linear model is used instead of the exponential model until the current drops below imax, or until convergence is achieved. Theimelt serves as a limit warning for the junction current [15]. Using the forward transport current I tf as an example, the 51 programming flow is as follows [16]. Defining V max = N F V T ln parenleftBig imax I S + 1 parenrightBig ,ifV BEI < V max , I tf = I S bracketleftbigg exp parenleftbigg V BEI N F V T parenrightbigg ? 1 bracketrightbigg (4.1) which is the normal exponential model. If V BEI ? V max , I tf = imax+ V BEI ?V max N F V T (imax+I S ) (4.2) which becomes the linear model of V BEI . All other currents are limited in the same way. An example of I tf in Verilog-A is as follows. First, an analog function expf that includes a switch to the exponential model and the linear model controlled by the threshold current imax is defined for a junction current. This analog function is suitable for all the junction currents. analog function real expf; input v,fac1,fac2; real v,fac1,fac2; real vmax, expL; begin if (fac2>0) begin vmax= fac1*ln(1.0+imax/fac2); end else begin 52 vmax = 0.0; end expL = limexp(v/fac1); if (v imelt) $strobe( "Warning: branch be is melting!" ); The Warning message ?Warning: branch be is melting!? will be displayed in the output log file. If it is used for port current, like b, it is described as, 53 if (I() > imelt) $strobe( "Warning: device port b is melting!" ); 4.3.3 Logarithm Error Once the convergence problems had been solved, the Verilog-A based model ran relatively smoothly and fast. However, the Verilog-A based model DC and ac simu- lation results failed to produce the same results as the Cadence built-in VBIC model. Carefully debugging the code revealed that it was the definition of log that was causing the deviations. In Verilog-A, log stands for log 10 , not log e as needed here. Therefore, ln must be used instead of log. In the original Verilog-A VBIC code, the function definitions of psiio, psiin, and psibi are related to the temperature mapping model of all the capacitances. They are defined using log, as shown in the following, psiio = 2.0*(Vtv/rT)*log(exp(0.5*P*rT/Vtv)-exp(-0.5*P*rT/Vtv)); psiin = psiio*rT-3.0*Vtv*log(rT)-Ea*(rT-1.0); psibi = psiin+2.0*Vtv*log(0.5*(1.0+sqrt(1.0+4.0*exp(-psiin/Vtv)))); If log is not corrected to be ln, this will cause the inaccurate temperature mapping models observed for the capacitances. Even at room temperature, problems will occur in the high bias due to the self-heating e?ect. The corrected code becomes, psiio = 2.0*(Vtv/rT)*ln(exp(0.5*P*rT/Vtv)-exp(-0.5*P*rT/Vtv)); psiin = psiio*rT-3.0*Vtv*ln(rT)-Ea*(rT-1.0); 54 psibi = psiin+2.0*Vtv*ln(0.5*(1.0+sqrt(1.0+4.0*exp(-psiin/Vtv)))); Another error introduced by the log definition is related to the epi layer current I rci . The original code is, Iohm=(V(rci)+Vtv*(Kbci-Kbcx-log(rKp1)))/RCIatT; derf=IVO*RCIatT*Iohm/(1.0+0.5*IVO*IHRCF*sqrt(V(rci)*V(rci)+0.01)); Irci=Iohm/sqrt(1+derf*derf); If not corrected, this causes an the error in I rci . The corrected code becomes, Iohm=(V(rci)+Vtv*(Kbci-Kbcx-ln(rKp1)))/RCIatT; derf=IVO*RCIatT*Iohm/(1.0+0.5*IVO*IHRCF*sqrt(V(rci)*V(rci)+0.01)); Irci=Iohm/sqrt(1+derf*derf); 4.3.4 Noise Modeling At present, the Verilog-A model does not include noise modeling. For RF simu- lation purposes, it is necessary to add in a noise modeling component in the Verilog-A based VBIC model in order to be consistent with the Cadence built-in model. The noise models were added as follows. I(cei) <+ white_noise(2*?QQ*abs(Itzf)); I(bei) <+ white_noise(2*?QQ*abs(Ibe)) +flicker_noise(KFN*pow(abs(Ibe,AFN),BFN); I(bex) <+ white_noise(2*?QQ*abs(Ibex)) 55 +flicker_noise(KFN*pow(abs(Ibex),AFN),BFN); I(rcx) <+ white_noise(4*?KB*Tdev*(1/RCX)); I(rci) <+ white_noise(4*?KB*Tdev*(1/RCI)); I(rbx) <+ white_noise(4*?KB*Tdev*(1/RBX)); I(rbi) <+ white_noise(4*?KB*Tdev*(1/RBI)); I(re) <+ white_noise(4*?KB*Tdev*(1/RE)); I(rs) <+ white_noise(4*?KB*Tdev*(1/RS)); I(cep) <+ white_noise(2*?QQ*abs(Iccp)); I(bep) <+ white_noise(2*?QQ*abs(Ibep)) +flicker_noise(KFN*pow(abs(Ibep),AFN),BFN); I(rbp) <+ white_noise(4*?KB*Tdev*(1/RBP)); 4.4 Comparison with built-in model Finally, the complete Verilog-A based VBIC model was successfully implemented into Cadence. The DC, ac, noise, and large signal simulation results for a 50 GHz tech- nology device were compared between the Verilog-A based VBIC model and Cadence built-in VBIC model. The emitter area used was 0.5?2.5 ?m 2 . The results of the com- parison show that the new Verilog-A based VBIC model is identical to the Cadence built-in VBIC model. 56 4.4.1 DC Simulation Fig. 4.1 (a) shows a Gummel curve comparison of the Verilog-A based VBIC model and Cadence built-in VBIC model. Perfect agreement is achieved. A compar- ison of the output curves of the Verilog-A based VBIC model and the Cadence built-in VBIC model is shown in Fig. 4.1 (b). The Verilog-A based VBIC model clearly agrees with the Cadence built-in VBIC model very well. 0.5 0.6 0.7 0.8 0.9 1 10 ?12 10 ?10 10 ?8 10 ?6 10 ?4 10 ?2 V BE (V) I B & I C (A) Cadence built?in VBIC Verilog?A VBIC V CB = 0 V (a) 0 1 2 3 4 5 ?1 0 1 2 3 4 5 6 x 10 ?3 V CE (V) I C (A) Cadence built?in VBIC Verilog?A VBIC I B = 5 ?A I B = 15 ?A I B = 25 ?A I B = 35 ?A I B = 45 ?A (b) Figure 4.1: (a) Gummel curve comparison of Verilog-A based VBIC model and Ca- dence built-in VBIC model. (b) Output curve comparison of Verilog-A based VBIC model and Cadence built-in VBIC model. 57 4.4.2 ac Simulation Fig. 4.2 and 4.3 show the comparisons of the bias and frequency dependence of S- parameters for the Verilog-A based VBIC model and the Cadence built-in VBIC model. All of the S-parameters of the Verilog-A based VBIC model are identical to the Cadence built-in VBIC model. Since the S-parameters of the Verilog-A based VBIC model are identical to the Cadence built-in VBIC model, the cuto? frequency f T is the same for the two models, as shown in Fig. 4.4. 0.7 0.8 0.9 1 ?4 ?3 ?2 ?1 0 0.7 0.8 0.9 1 ?35 ?30 ?25 ?20 Cadence built?in VBIC Verilog?A VBIC 0.7 0.8 0.9 1 ?20 ?10 0 10 20 30 0.7 0.8 0.9 1 ?8 ?6 ?4 ?2 0 S 11 (dB) V BE (V) S 12 (dB) V BE (V) S 21 (dB) V BE (V) S 22 (dB) V BE (V) A E = 0.5 ? 2.5 ?m 2 Freq = 2 GHz Figure 4.2: S-parameters vs V BE curves of Verilog-A based VBIC model and Cadence built-in VBIC model. 58 2 4 6 8 10 ?3 ?2.5 ?2 ?1.5 Cadence built?in VBIC Verilog?A VBIC 2 4 6 8 10 ?30 ?28 ?26 ?24 ?22 ?20 2 4 6 8 10 10 15 20 25 2 4 6 8 10 ?10 ?8 ?6 ?4 ?2 0 S 11 (dB) Frequency (GHz) S 12 (dB) Frequency (GHz) S 21 (dB) Frequency (GHz) S 22 (dB) Frequency (GHz) V CB = 0 V V BE = 0.85 V A E = 0.5 ? 0.25 ?m 2 Figure 4.3: S-parameters vs f curves of Verilog-A based VBIC model and Cadence built-in VBIC model. 10 ?6 10 ?5 10 ?4 10 ?3 10 ?2 0 5 10 15 20 25 30 35 40 45 50 I C (A) f T (GHz) Cadence built?in VBIC Verilog?A VBIC A E = 0.5 ? 2.5 ?m 2 V CB = 0 V Figure 4.4: f T vsI C of Verilog-A based VBIC model and Cadence built-in VBIC model. 59 4.4.3 Noise Simulation The Verilog-A based VBIC model generates identical minimum noise figure NF min and noise resistanceR n results to the Cadence built-in VBIC mode, as shown in Fig. 4.5. 10 ?2 10 0 0 2 4 6 8 Cadence built?in VBIC Verilog?A VBIC 0 2 4 6 8 10 0 0.5 1 1.5 2 10 ?2 10 0 0 100 200 300 400 500 0 2 4 6 8 10 10 11 12 13 NF min (dB) I C (mA) NF min (dB) Frequency (GHz) R n ( ? ) I C (mA) R n ( ? ) Frequency (GHz) A E = 0.5 ? 2.5 ?m 2 V CB = 0 V Freq = 2 GHz A E = 0.5 ? 2.5 ?m 2 V CB = 0 V V BE = 0.85 V A E = 0.5 ? 2.5 ?m 2 V CB = 0 V Freq = 2 GHz A E = 0.5 ? 2.5 ?m 2 V CB = 0 V V BE = 0.85 V Figure 4.5: Bias and frequency dependence of NF min and R n of Verilog-A based VBIC model and Cadence built-in VBIC model. 60 4.4.4 Large Signal Simulation P out vs P in of Verilog-A based VBIC model and Cadence built-in VBIC model are compared in Fig. 4.6. The results show that the Verilog-A based VBIC model produces identical large signal simulation results to the Cadence built-in VBIC mode. ?40 ?30 ?20 ?10 0 ?20 ?10 0 10 20 Input Power (dBm) Output Power (dBm) Cadence built?in VBIC Verilog?A VBIC Figure 4.6: P out vs P in of Verilog-A based VBIC model and Cadence built-in VBIC model. 4.5 Summary The VBIC model was converted into the Verilog-A language, and implemented into circuit simulators Cadence and ADS. The main problems that arose, including syn- tax errors, convergence problems and numerical problems, were solved. Noise models 61 were then added to the Verilog-A based model to be consistent with the Cadence built-in model. Comparisons of the DC, ac, noise and large signal simulation comparisons be- tween the Verilog-A based VBIC model and the Cadence built-in VBIC model revealed identical results. 62 CHAPTER 5 USING VERILOG-A FOR SIGE HBT NOISE MODELING As discussed in Chap 2, the main reason for using Verilog-A based modeling is its convenience, as it can be easily modified without the need to interface with the circuit simulator. In addition, the internal currents, capacitors, and noise sources are accessible, which is not the case for built-in models. This makes it possible for device and modeling researchers to investigate the device physics and modeling in detail and more e?ciently. In this chapter, two Verilog-A based VBIC model applications for SiGe HBT noise modeling are presented. 5.1 Inverse circuit simulation for 1/f Noise Transistor low-frequency noise is an important issue in both the baseband and RF circuits of a wireless transceiver due to its conversion to phase noise. In a bipolar tran- sistor, the major low-frequency noise source lies in the base current. Experimentally, it has been established that this base current noise source is located between the internal base and emitter nodes in an equivalent circuit. This base current low-frequency noise, denoted as i bn , is often measured indirectly from the collector voltage noise by applying to the transistor base a source impedance that is much greater than the input impedance, as shown in Fig 5.1. The measured collector voltage noise is converted to collector cur- rent noise using S I C = S V C /R 2 C,eff which is then converted to the base current noise using S I B = S I C /? 2 ac , with ? ac being the low-frequency small signal ac current gain. ? ac 63 is often determined from the device?s Gummel characteristics, measured under a biasing condition close to that used in the noise measurement. The base current noise can also be measured ?directly? from the base using a high precision current amplifier with an input impedance much lower than the transistor input impedance. Each method has its advantages and disadvantages in practice, as discussed in [17]. In general, the indirect method is easier to implement, and is widely used. The indirect method was applied for this research project [18]. Similar limitations and assumptions exist in the ?direct? measurement method. Figure 5.1: Small signal equivalent circuit assumed in the conventional method. The widely used conventional measurement method is based on a simplified equiv- alent circuit derived under isothermal conditions. However, in modern SiGe HBTs, self-heating can be significant, in part due to their high operating current density. To en- able high current density operation, the collector doping is increased with device vertical 64 scaling, which then increases the collector-base junction field and thus creates problems with avalanche multiplication. Errors are therefore expected in the low-frequency noise measured using conventional method in high speed SiGe HBTs. Here, a new method was developed to extract the base current low-frequency noise that takes into account the higher order physical e?ects that are significant in modern SiGe HBTs, such as avalanche multiplication and self-heating. Instead of basing the extraction on a simplified small signal equivalent circuit, the same circuit as that used in noise measurement was simulated. The circuit simulator used in this work was Cadence SpectreRF. For a given internal base current noise excitation, the collector voltage noise was simulated, and the noise transfer function, or the noise gain G noise , obtained from the ratio of the simulated collector voltage noise and internal base current noise exci- tation. The internal base current noise was then extracted from the measured collector voltage noise using S I B = S V C /G noise . This extraction method is referred to as inverse circuit simulation based low-frequency noise extraction, as the input base current noise is essentially simulated from the measured output voltage noise. The Verilog-A based VBIC model is the best way to implement this new inverse cir- cuit simulation method due to its easy access to the internal base and collector currents, the key point of this method. The VBIC model also takes into account self-heating and avalanche multiplication e?ects. As a result, the impact of self-heating and avalanche multiplication on low-frequency noise extraction are automatically included. Further- more, other non-ideal e?ects such as the Early e?ect, terminal parasitic resistances, and high injection e?ects are also accounted for. 65 When a unity magnitude small signal noise current is placed between the inter- nal base and emitter nodes, the resulting collector voltage noise gives the noise gain. The measured collector voltage noise is then divided by the simulated noise gain for all frequencies to obtain the internal base current noise spectrum, i.e. S I BE = S V C /G noise . Fig 5.2 compares the S I BE spectra extracted using the conventional method and the pro- posed inverse circuit simulation method. V CB = 2V,I BE = 10 ?A, terminal base current I B is 8.1 ?A,. The S I BE extracted from inverse circuit simulation is almost 10 times higher than that from the conventional method. Figure 5.2: Comparison of S I BE spectra extracted to the proposed inverse circuit simu- lation and the conventional measurement method. V CB =2V,I BE =2 ?A. In the research reported here, an inverse circuit simulation based method was de- veloped for the extraction of base current noise spectra in advanced SiGe HBTs. A 66 key di?erence from the conventional method is that the noise gain is obtained much more accurately by taking into account higher order e?ects such as avalanche multipli- cation and self-heating. The utility of the method was demonstrated by examining the collector-base voltage and base transport current dependence of 1/f noise. The pro- posed method can be applied to the extraction of the correlation between base current noise and collector current noise using a double channel dynamic signal analyzer. 5.2 Noise generating current in oscillators Oscillator phase noise is an important concern for RF semiconductor technology. Physically speaking, oscillator phase noise results from transistor 1/f noise, base re- sistance thermal noise, the base and collector current shot noise, as well as any other thermal noise sources in the passive components (e.g. inductors). Besides 1/f noise, there is always thermal noise due to base resistance and the base and collector current shot noise associated with the DC currents. To identify the phase noise limitations of today?s technologies, it is helpful to separate the phase noise contributions from various physical noise sources. The bottle neck of phase noise can then be identified and improved [19] [20]. In a small signal noise measurement, the transistor is biased at a fixedI B orI C . The small signal base current 1/f noise and base current shot noise are simple functions of the base terminal current I B , and the collector current shot noise is simple function of terminal current I C . In an oscillator, the situation is complicated as: 67 1. The terminal base current I B has a large capacitive component, which does not contribute to either 1/f noise or shot noise. Instead, the internal base to emitter junction current, I BE , is responsible for noise generation. This is illustrated in Fig. 5.3 using a simplified large signal transistor model. Similarly, the terminal I C is di?erent from the noise generating collector to emitter transport currentI CE . 2. The internal I BE and I CE responsible for base and collector current noise genera- tion is periodically oscillating. Figure 5.3: A simplified large transistor model. Therefore, to understand the phase noise upconversion process, it is first necessary to separate the internal I BE from the external I B , and the internal I CE from the external I C . The internal I BE and the internal I CE can be accessed by the Verilog-A based VBIC model to better understand the di?erent upconversion mechanisms of the base current 1/f noise and base current short noise. 68 Fig. 5.4 shows the waveforms of the terminal I B , the noise generating internal I BE , and internal base-emitter voltage V BE for an oscillator designed with the 50 GHz peak f T SiGe HBT. The di?erence between I B and I BE is obvious even where the device peak f T is much higher than the oscillation frequency (5.5 GHz). Due to the nature of oscillations, the base emitter junction is turned on and o? periodically, as shown on the right y-axis of Fig. 5.4 . A significant portion of the terminal base current is due to capacitive charging and discharging of the strongly nonlinear junction capacitances. The noise generating current, I BE , is only a small portion of the terminal I B . Figure 5.4: Comparison of terminal I B and internal I BE for the 50 GHz HBT. The internal V BE is shown on the right y-axis. 69 5.3 Summary Using the Verilog-A base VBIC model, a new inverse circuit simulation based method for extraction of base current noise spectra in advanced SiGe HBTs was pro- posed. The utility of the method was demonstrated by examining the collector-base voltage and base transport current dependence of 1/f noise. To better understand the di?erent upconversion mechanisms of the base current 1/f noise and base current short noise, the internal I BE from the external I B , and the internal I CE from the external I C were successfully separated by the Verilog-A based VBIC model. 70 CHAPTER 6 TEMPERATURE SCALABLE MODELING OF DC CURRENTS SiGe HBTs have demonstrated their ability to operate over a wide temperature range that is of particular interest for designers of extreme environment electronics, from -230 ? Cto300 ? C, along with excellent tolerance to high doses of radiation [2]. This, together with its integration with CMOS, makes SiGe BiCMOS technology very attractive for implementing electronics for aviation and space exploration [21]. Of critical importance to successful circuit design is the availability of accurate device models. At present, designers of electronics for extreme environment electron- ics have to use the same device models used by general purpose electronics designers, which are only suitable between -55 ? Cto120 ? C. Fig. 6.1 compares the measured and simulated Gummel curves at 43 K and 85 K for an IBM SiGe HBT with 50 GHz peak f T . The general purpose model parameters from IBM?s design kit were used to gener- ate the curves in the figure, which are intended for applications from -55 ? Cto120 ? C. Clearly, the VBIC model, as is, does not work well at these low temperatures. A temporary solution is to use VBIC as an isothermal model. The temperature dependences of device parameters are turned o?, and device parameters are extracted to fit measured data at a single temperature. This can be repeated for several temperature points across the temperature range of interest. Clearly, this approach does not allow for self-heating. More importantly, this approach cannot be used to design circuits that require continuous description of device performance over temperature [2], such as the 71 0.8 0.9 1 1.1 1.2 10 ?14 10 ?12 10 ?10 10 ?8 10 ?6 10 ?4 10 ?2 V BE (V) I B & I C (A) T = 43 K T = 85 K Solid lines: Measured Data Dash lines: Simulated Data V CB = 0 V A E = 0.5 ? 2.5 ?m 2 Figure 6.1: Comparison of Gummel curves from Cadence simulation results and mea- surement data at low temperatures. bandgap reference circuit, a fundamental circuit block critical to the reliable operation of numerous analog, digital, and mixed-signal circuits over a wide range of temperatures. The VBIC model is chosen for these simulations as it is used in the design kit for this technology. Here, the temperature dependence of key VBIC model parameters for DC current modeling from 300 K to 43 K was examined. The temperature mapping models were then evaluated. A group of improved temperature mapping models for DC currents were presented and implemented using Verilog-A, with an emphasis on lower temperature operation down to 43 K. Excellent fitting was obtained using a single set of model 72 parameters. These results are useful for the design of circuits that need to operate from 300 K down to 43 K [22]. 6.1 Evaluation of Temperature Mapping Models in VBIC The isothermal model parameters were first extracted using gradient search and quasi-Newton search optimization based on least-squares error functions. Device physics was considered during extraction to obtain physically meaningful parameters. In VBIC, as outlined in Chapter 3, the collector current is described by I C = I tf ?I tr q b (6.1) I tf = I S bracketleftbigg exp parenleftbigg V BEI N F V T parenrightbigg ? 1 bracketrightbigg (6.2) I tr = I S bracketleftbigg exp parenleftbigg V BCI N R V T parenrightbigg ? 1 bracketrightbigg (6.3) I S and N F are temperature dependent. The T dependence of I S is described by I S (T) = I s,nom r X is N F,nom T e ? Ea(1?r T ) N F,nom V T (6.4) where the subscript nom indicates nominal temperature, r T = T/T nom , X is is the temper- ature exponent of I S , and E a = E g (0) is activation energy for I S . The T dependence of N F in VBIC is given by N F (T) = N F,nom (1+T nf d T ) (6.5) 73 where T nf is temperature coe?cient of N F , and d T = T ?T nom . As shown in Eq. (6.5), N F in VBIC is linearly dependent on temperature. The extracted isothermal N F parameter, however, indicates a stronger dependence on tem- perature, as shown in Fig. 6.2. A similar temperature dependence is also observed for the extracted N EI parameter, the counterpart of N F for base current that is described in VBIC. 0 50 100 150 200 250 300 1 1.1 1.2 1.3 1.4 1.5 Temperature (K) Forward Ideality Factor N F Extracted N F N F Model in VBIC V CB = 0 V A E = 0.5 ? 2.5 ?m 2 Figure 6.2: Comparison of extracted isothermal N F and N F temperature mapping model in VBIC. Fig. 6.3 shows the extracted isothermal I S vs temperature, together with fitting results using Eq. (6.4). The fitting is good at high temperature, but becomes worse at low temperatures. Attempts were made to calibrate temperature related parameter E a 74 and X is to obtain a better fitting, but it was not possible to fit the data for 43 K and 110 K simultaneously. Other parameters related to DC current modeling were also extracted for all the temperatures, and their temperature mapping models were evaluated, including terminal resistances, quasi-saturation parameters, forward knee current I KF , ideal B-E saturation current I BEI , and so forth. In general, the temperature mapping models of many of the parameters in VBIC were not su?cient to cover the wide temperature range from 300 K to 43 K. Improved equations are therefore clearly necessary. For the following parameters, the temperature mapping models in VBIC were found to be su?cient: 1. terminal resistances: intrinsic base resistance R bi , extrinsic base resistance R bx , extrinsic collector resistance R cx , and emitter resistance R e . 2. quasi-saturation parameters: intrinsic collector resistance R ci , epi drift saturation voltage V o , epi doping parameter G amm , and high current RC factor H rcf . The temperature mapping models of the key parameters that need to be improved for modeling over a wide temperature range are discussed below. 6.2 Improved Temperature Mapping Models The primary reason for the limited applicable temperature range of current mod- els is thought to be that the model equations were derived using simplified physics or assumptions that do not cover the wide temperature range of interest for this work. Im- proved temperature mapping models for key parameters of importance to DC currents 75 0 50 100 150 200 250 300 10 ?100 10 ?50 10 0 Temperature (K) Saturation Current I S (A) Extracted I S I S model in VBIC V CB = 0 V A E = 0.5 ? 2.5 ?m 2 Figure 6.3: Comparison of I S temperature mapping model in VBIC and extracted isothermal I S parameters. were therefore constructed. The corresponding Verilog-A code for each section can be found in Appendix A. 6.2.1 Improved N F Temperature Mapping Model As shown in Fig. 6.2, the ideality factor N F increases exponentially with decreas- ing temperature as a result of carrier transport mechanism across the E-B heterojunc- tion [23]. To better describe the temperature dependence of N F , two extra terms, A nf and X nf , can be introduced based on the N F temperature mapping model in VBIC. The 76 modified equation is N F (T) = N F,nom (1+T nf d T +A nf (r X nf T ? 1)). (6.6) Similarly, N EI also increases exponentially with decreasing temperature due to additional base current induced by extra recombination [23]. This can be modeled using the same temperature mapping equation, but with di?erent N F,nom , T nf , A nf , and X nf values. Fig. 6.4 shows the improved N EI and N F modeling results using Eq. (6.6). 0 50 100 150 200 250 300 1 1.1 1.2 1.3 1.4 1.5 Extracted N EI New N EI Model Extracted N F New N F Model Ideality Factor N EI and N F V CB = 0 V Temperature (K) N EI N F A E = 0.5 ? 2.5 ?m 2 Figure 6.4: Improved N EI and N F model with new equations. 77 6.2.2 Improved I S Temperature Mapping Model The most significant parameter responsible for T dependence of I S is E a , which is essentially the bandgap energy at 0 K, and thus a constant. However, a close examination of the derivation of I S shows that this is only true when the bandgap is assumed to be a linear function of temperature. This assumption becomes less valid, however, over a wide temperature range. A new derivation of I S taking into account the nonlinear T dependence of the bandgap leads to a new I S equation of similar form to (6.4), but with a temperature dependent activation energy, which we denote asE a,true [24]. The detailed derivation of E a,true is shown as follows. Physically, as derived in (3.82) in Chapter 3, I S can be rewritten as I S (T) = I S (T nom ) parenleftbigg T T nom parenrightbigg X IS exp bracketleftbigg ? E g (T) KT + E g (T nom ) KT nom bracketrightbigg (6.7) Empirically, E g (T) = E g (0) ? ?T 2 T +? (6.8) where ? and ? are temperature related parameters. E g can be introduced into the expo- nential term of I S . Let A = ? E g (T) KT + E g (T nom ) KT nom (6.9) = ? 1 KT bracketleftbigg E g (T) ?E g (T nom ) T T nom bracketrightbigg (6.10) 78 E g (T nom ) is obtained by substituting T by T nom in (6.8), E g (T nom ) = E g (0) ? ?T 2 nom T nom +? (6.11) Substituting (6.8) and (6.11) in (6.13) gives A = ? 1 KT bracketleftbigg E g (0) ? ?T 2 T +? ?E g (0) T T nom + ?T 2 nom T nom +? T T nom bracketrightbigg (6.12) = ? 1 KT bracketleftbigg E g (0) parenleftbigg 1 ? T T nom parenrightbigg + ?T 2 nom T nom +? T T nom ? ?T 2 T +? bracketrightbigg (6.13) Let B = ?T 2 nom T nom +? T T nom ? ?T 2 T +? (6.14) = ?T 2 T nom +??TT nom ??T 2 T nom ???T 2 (T +?)(T nom +?) (6.15) = ??TT nom ???T 2 (T +?)(T nom +?) (6.16) = ??TT nom parenleftBig 1 ? T T nom parenrightBig (T +?)(T nom +?) (6.17) = ?? T T nom T 2 nom (T +?)(T nom +?) parenleftbigg 1 ? T T nom parenrightbigg (6.18) Substituting (6.18) into (6.13) produces A = ? 1 KT bracketleftBigg E g (0) parenleftbigg 1 ? T T nom parenrightbigg + ?? T T nom T 2 nom (T +?)(T nom +?) parenleftbigg 1 ? T T nom parenrightbigg bracketrightBigg (6.19) 79 A = ? 1 KT parenleftbigg 1 ? T T nom parenrightbigg bracketleftBigg E g (0) + ?? T T nom (T nom ) 2 (T +?)(T nom +?) bracketrightBigg (6.20) = ? 1 KT (1 ?r T ) bracketleftbigg E g (0) + ??r T (T nom ) 2 (T +?)(T nom +?) bracketrightbigg (6.21) Substituting (6.21) into (6.7), I S becomes I S (T) = I S (T nom ) parenleftbigg T T nom parenrightbigg X IS exp braceleftbigg ? 1 KT (1 ?r T ) bracketleftbigg E g (0) + ??r T (T nom ) 2 (T +?)(T nom +?) bracketrightbiggbracerightbigg (6.22) Comparing (6.22) to (3.86) in Chapter 3, the new E a is E a (T) = E g (0) + ??r T (T nom ) 2 (T +?)(T nom +?) (6.23) Mapping E a from T nom to T gives E a (T nom ) = E g (0) + ??(T nom ) 2 (T nom +?) 2 (6.24) hence, E g (0) = E a (T nom ) ? ??(T nom ) 2 (T nom +?) 2 (6.25) 80 Finally, E a,true is E a,true (T) = E a (T nom ) + ??r T (T nom ) 2 (T +?)(T nom +?) ? ??(T nom ) 2 (T nom +?) 2 (6.26) = E a,nom + ?? 2 T 2 nom (r T ? 1) (? +T nom ) 2 (? +T) (6.27) where E a,nom = E a (T nom ). Then I S is changed to I S (T) = I s,nom r X is N F,nom T e ? Ea,true(1?r T ) N F,nom V T (6.28) In addition, to alleviate the convergence problem at low temperatures, the temperature dependent parameter N F is used to replace N Fnom in the I S equation. The new I S equation is I S (T) = I s,nom r X is N F T e ? Ea,true(1?r T ) N F V T (6.29) E a,true can be extracted as the E a required to fit the I S at each temperature in the original I S model. Fig. 6.5 compares the extracted and modeled E a,true . A good fitting has been obtained. With the new I S model, good I S modeling is achieved, as shown in Fig. 6.6, from 300Kdownto43K.ThenewI S model is also expected to work at temperatures from 300 K to at least 400 K, the same range for which the conventional I S model works. The same equation is also applied to describe the saturation current for I B , I BEI . 81 0 50 100 150 200 250 300 1 1.02 1.04 1.06 1.08 1.1 1.12 1.14 1.16 1.18 1.2 Temperature (K) E a,true (V) Extracted E a,true E a,true with Model Figure 6.5: E a,true as a function of temperature fitted using Eq. (6.27). 6.2.3 Improved I KF Temperature Mapping Model The knee current I KF , which was originally used to physically describe high injec- tion in the base of a BJT, has now become an empirical parameter for SiGe HBT due to highly doped base. However, the I KF extraction results show that the I KF tempera- ture mapping model in VBIC is no longer adequate for SiGe HBTs. A new temperature mapping model for I KF is proposed I KF (T) = I KF,nom (1?T ikf d T +A ikf (r X ikf T ? 1)) (6.30) Using Eq. 6.30, excellent fitting of I KF is achieved, as shown in Fig. 6.7. 82 0 50 100 150 200 250 300 10 ?100 10 ?80 10 ?60 10 ?40 10 ?20 10 0 Extracted I S New I S model with E a,true Saturation Current I S (A) V CB = 0 V Temperature (K) A E = 0.5 ? 2.5 ?m 2 Figure 6.6: Improved I S fitting with new E a,true model. 6.2.4 Temperature Mapping Models for R th and avc2 The temperature dependence of thermal resistance R th , which describes the ex- cess temperature due to dissipated power, is not included in VBIC. The extracted R th decreases with decreasing temperature. The temperature dependence ofR th can be mod- eled similarly to the way other regular resistances are modeled [25] [26]. The avalanche model parameter avc2 is a linear function of T in VBIC. A more complicated temperature model for better output curve fitting is therefore necessary. It has also been observed that the weak avalanche model itself in VBIC has limitations at 43 K, even when used as an isothermal model. Avalanche current data cannot be fitted by simply changing the temperature related avalanche parameters at 43 K. 83 0 50 100 150 200 250 300 0 1 2 3 4 x 10 ?3 Temperature (K) I KF (A) Extracted I KF New I KF Model V CB = 0 V A E = 0.5 ? 2.5 ?m 2 Figure 6.7: Improved I KF fitting with new temperature mapping model. 6.3 Simulation Results The VBIC based new model was implemented using Verilog-A, a hardware de- scription language, compiled into binary code, and dynamically linked to a circuit simu- lator (ADS) through its compact modeling interface. Fig. 6.8 shows the collector current and base current modeling results. Good fitting down to 43 K was obtained. Fig. 6.9 (a) and (b) show the output curve modeling results at 175 K and 43 K, respectively. Good data-model fitting was obtained at both temperatures. Note that a single set of model parameters was used to achieve fitting at all temperatures. 84 0.4 0.5 0.6 0.7 0.8 0.9 1 1.1 10 ?10 10 ?8 10 ?6 10 ?4 10 ?2 10 0 V BE (V) I C (A) Solid lines: Measured Data Dash lines: Model V CB = 0 V 300 K 223 K 175 K 110 K 43 K A E = 0.5 ? 2.5 ?m 2 (a) 0.5 0.6 0.7 0.8 0.9 1 1.1 10 ?10 10 ?8 10 ?6 10 ?4 10 ?2 V BE (V) I B (A) Solid lines: Measured Data Dash lines: Model V CB = 0 V 300 K 223 K 175 K 110 K 43 K A E = 0.5 ? 2.5 ?m 2 (b) Figure 6.8: (a) Improved I C -V BE fitting with new models, and (b) Improved I B -V BE fitting with new models. 85 0 1 2 3 4 0 0.5 1 1.5 2 2.5 x 10 ?3 I C (A) T = 175 K Solid lines: Measured Data Dash lines: Model V CE (V) A E = 0.5 ? 2.5 ?m 2 I B = 20 ?A 14 ?A 8.1 ?A 4.35 ?A 1.35 ?A 0.1 ?A (a) 0 0.5 1 1.5 2 2.5 3 3.5 0 0.2 0.4 0.6 0.8 1 x 10 ?3 I C (A) Solid lines: Measured Data Dash lines: Model A E = 0.5 ? 2.5 ?m 2 V CE (V) T = 43 K I B = 8.93 ?A 6.1 ?A 3.38 ?A 1.68 ?A 0.452 ?A (b) Figure 6.9: Improved DC output fitting at (a) 175 K, and (b) 43 K, with new models. 86 6.4 Summary This chapter reported the experimental examination of the temperature dependence of key VBIC model parameters for DC current modeling from 300 K to 43 K, and evaluated their temperature mapping models. New model equations were presented and implemented using Verilog-A. An excellent fitting was obtained using a single set of model parameters. 87 CHAPTER 7 MODELING OF INTERMODULATION LINEARITY IN A 200 GHZ SIGE HBT TECHNOLOGY Intermodulation linearity is an important figure-of-merit for RF devices, as it re- lates to the selectivity of a RF receiver and the spectral purity of a RF transmitter. Vari- ous theories, simulations, and experimental investigation of linearity have been reported for Si, SiGe and III-V bipolar transistors [27] [28] [29] [30] [31] [32]. Accurate sim- ulation and modeling of linearity is challenging, as it requires accurate descriptions of the higher order derivatives of all the nonlinear current and charge relationships in the device. From a circuit design standpoint, it is desirable to understand how linear- ity changes as a function of biasing current and voltage, as well as device breakdown voltage, as both biasing point and breakdown voltage are design variables. Another im- portant issue practically is how accurate the compact models are in simulating linearity. Model validation is typically done using DC I-V data and small signal s-parameters, rather than linearity data because of the complexity involved and the time consuming nature of linearity measurements. The purpose of this work was to evaluate the linearity simulation capability of the VBIC, HICUM and Mextram models in a 200 GHz SiGe HBT technology using harmonic balance. The results provide valuable new insights into the device physics underlying linearity behavior, guidelines to optimal biasing, device selection (e.g. high breakdown versus low breakdown versions), as well as quantified simulations for data 88 comparison of linearity that will be useful for designers and modelers. The input 3rd order intercept point, IIP3, is used here as a figure-of-merit for intermodulation linearity. IIP3 was measured on the I C -V CE plane for devices of various size and breakdown voltage [34]. Initially, the models used in this work were examined by comparing the simulated and measured I-V and small signal s-parameters. For the standard breakdown HBT, VBIC, Mextram and HICUM models were used from the design kit developed for the same HBT used in this work. All three of the models produced reasonable fittings for the I-V curves at low current levels. Fig. 7.1 and Fig. 7.2 show comparisons of the measured and VBIC simulated S-parameters vs frequency at V CE = 1.0 V, I C = 12.8 mA. Clearly, VBIC can model standard breakdown HBT well at low current. The Mextram and HICUM models also produced reasonable fitting of S-parameters at low current. The main di?erence is the high current behavior for the models. A detailed comparison of the high current I-V and S-parameters as a function of bias shows that for all the models, accuracy degrades at higher I C (even below peak f T ). Only the VBIC model is available for the high breakdown HBT. ADS, as opposed to Cadence SpectreRF, was used for this part of the research, because of its accuracy and e?ciency for IP3 simulation. The Cadence design kit was accessed through the ADS dynamic link in the Cadence tools. 89 0 10 20 30 40 ?1 ?0.5 0 0.5 data VBIC in ADS 0 10 20 30 40 ?0.8 ?0.6 ?0.4 ?0.2 0 0 10 20 30 40 0 0.02 0.04 0.06 0.08 0.1 0 10 20 30 40 0 0.01 0.02 0.03 0.04 0.05 ? (S 11 ) Freq (GHz) ? (S 11 ) Freq (GHz) ? (S 12 ) Freq (GHz) ? (S 12 ) Freq (GHz) 8HP 0.12 ? 18 ?m 2 , SBV V CE = 1.0 V, I C = 12.8 mA Figure 7.1: Comparison of measured and VBIC simulated S 11 & S 12 vs frequency at V CE = 1.0 V, I C = 12.8 mA. Standard Breakdown HBT. 7.1 Standard Breakdown HBT Fig. 7.3 (a)-(d) compare the simulated and measured IIP3 as a function of I C for the standard breakdown HBT. Initially, the V CE = 1.0 V case was examined. All three of the models performed well at I C < 5 mA. For I C >5mAandI C < 20 mA, all of the models were o? by approximately 2 dB. At V CE = 1.0 and 1.3V, only HICUM was able to model the high current IP3 rollo? and rise behavior (near 30 mA), because of its improved high current region modeling. However, in terms of the IIP3 value 90 0 10 20 30 40 ?15 ?10 ?5 0 5 data VBIC in ADS 0 10 20 30 40 2 4 6 8 10 12 0 10 20 30 40 ?0.2 0 0.2 0.4 0.6 0.8 0 10 20 30 40 ?0.6 ?0.5 ?0.4 ?0.3 ?0.2 ?0.1 ? (S 21 ) Freq (GHz) ? (S 21 ) Freq (GHz) ? (S 22 ) Freq (GHz) ? (S 22 ) Freq (GHz) 8HP 0.12 ? 18 ?m 2 , SBV V CE = 1.0 V, I C = 12.8 mA Figure 7.2: Comparison of measured and VBIC simulated S 21 & S 22 vs frequency at V CE = 1.0 V, I C = 12.8 mA. Standard Breakdown HBT. discrepancy, the VBIC model was the most accurate below 25 mA. Model comparisons at V CE = 1.3 V were similar to those at V CE = 1.0 V. At V CE = 1.6 and 1.9 V, HICUM and Mextram show no clear advantages over VBIC. 91 7.2 High Breakdown HBT Moving on to a comparison of the simulated and measured IIP3 for the high break- down HBT, Fig. 7.4 (a)-(d) compares simulated and measured IIP3 as a function of I C for V CE = 1.3, 1.9, 2.5 and 92 ?20 ?10 0 IIP3 (dBm) ?20 ?10 0 IIP3 (dBm) data VBIC MEXTRAM HICUM ?20 ?10 0 IIP3 (dBm) 0 10 20 30 40 50 ?20 ?10 0 10 I C (mA) IIP3 (dBm) V CE = 1.0 V V CE = 1.3 V V CE = 1.6 V V CE = 1.9 V 8HP 0.12 ? 18 ?m 2 SBV Device Freq = 5 GHz (a) (b) (c) (d) Figure 7.3: Comparison of simulated and measured IIP3 at V CE = 1.0, 1.3, 1.6 and 1.9 V. Standard Breakdown HBT. 93 ?40 ?20 0 20 IIP3 (dBm) data VBIC in ADS ?20 ?10 0 10 IIP3 (dBm) ?20 ?10 0 10 IIP3 (dBm) 0 2 4 6 8 10 ?20 ?10 0 I C (mA) IIP3 (dBm) V CE = 1.3 V V CE = 1.9 V V CE = 2.5 V V CE = 3.1 V 8HP 0.12 ? 18 ?m 2 HBV Device Freq = 5 GHz (a) (b) (c) (d) Figure 7.4: Comparison of simulated and measured IIP3 at V CE = 1.3, 1.9, 2.5 and 3.1 V. High Breakdown HBT. 94 3.1 V, using VBIC, the only model available. The simulation agrees well with the mea- surement at lower I C and lower V CE and captures the overall variation of IIP3 with I C and V CE . Quantitative agreement, however, is not satisfactory at higher I C or higher V CE . 7.3 Impact of Avalanche and Self-heating The Volterra series based analysis reported in [29] showed that cancellation of CB capacitance nonlinearity and avalanche nonlinearity can result either in improvement of IIP3, or they can enhance each other to further degrade IIP3. In this simulation, it is pos- sible to turn on and o? the avalanche function, as well as self-heating, to examine their impact on IIP3. Initially, the avalanche model was examined by comparing the simu- lated and measured multiplication factor M-1, as shown in Fig. 7.5. Good multiplication factor M-1 fitting was obtained. Fig. 7.6 compares the IIP3 simulated with various op- tions for the standard breakdown HBT, at V CE =1.9V. The M-1 value in simulation (and measurement) is 0.002 at 5 mA and V CE = 1.9V, which is weak. Below 25 mA, the IIP3 simulated with avalanche is considerably higher, both with and without self-heating. Above 25 mA, the IIP3 simulated without avalanche is higher. In the existing compact models, M-1 is only a function of the internal VCB. Therefore, only the I C dependence of M-1 due to the ICRC voltage drop is included, while the I C dependence of avalanche due to charge modulation in the CB junction is not accounted for. This results in an overestimation of M-1 at higher I C in simulation. Including the decrease of M-1 with increasing I C brings the high I C region IIP3 closer to the experimental results in the 95 high I C region. Given that a weak avalanche can have a large impact on IIP3, accurate measurement and modeling of the I C dependence of avalanche are clearly necessary. Self-heating exhibited only a weak e?ect on IIP3. 0 0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 10 ?8 10 ?6 10 ?4 10 ?2 10 0 V CB (V) Multiplication Factor M?1 data simulation 8HP 0.12 ?18 ?m 2 , SBV V BE = 0.65 V Figure 7.5: Comparison of simulated and measured M-1 at V BE = 0.65 V. Standard Breakdown HBT. 7.4 Summary This chapter presented the results of VBIC, HICUM, and Mextram simulation of intermodulation linearity in a 200 GHz standard breakdown SiGe HBT device and com- pared the I C and V CE dependences of IIP3. At relatively low values of I C and V CE , 96 0 10 20 30 40 50 60 ?16 ?14 ?12 ?10 ?8 ?6 ?4 ?2 0 data VBIC with AV on, SH on VBIC with AV on, SH off VBIC with AV off, SH on VBIC with AV off, SH off IIP3 (dBm) 8HP 0.12 ? 18 ?m 2 , SBV Freq = 5 GHz, V CE = 1.9 V I C (mA) Figure 7.6: Comparison of IIP3 simulated using di?erent combinations of avalanche and self-heating settings and measured IIP3 at V CE = 1.9 V. Standard Breakdown HBT. VBIC, HICUM, and Mextram all yielded reasonably accurate IIP3. However, at rela- tively higherI C (still well below peakf T for standard breakdown HBT) andV CE , signif- icant deviations between simulation and measurement occurred. In some cases, HICUM better captured the trend of IIP3 variation with I C in the high current region. The e?ect of avalanche on IIP3 was shown to be significant, while the e?ect of self-heating on IIP3 was weak. 97 CHAPTER 8 CONCLUSIONS AND FUTURE WORK 8.1 Conclusions This research study investigated device physics and compact modeling using a new technique ? the Verilog-A based VBIC model, which makes a portable device compact model for the simulator and can be easily modified and implemented into SPICE sim- ulators without the need to construct new interfaces. The internal currents, charges, and noise sources used in SPICE simulators, which are not available in built-in models, became readily accessible using this technique. Chapter 2 introduced the Verilog-A Language. The principles involved in using Verilog-A based compact modeling instead of low-level simulator code were discussed. An example of Verilog-A based diode modeling was given to provide a better under- standing of the Verilog-A language. The device physics behind the VBIC model and the temperature models in VBIC were introduced in Chapter 3. The VBIC model was con- verted to the Verilog-A language, and implemented into the SPICE simulators Cadence and ADS in Chapter 4. The major problems that arose, such as syntax errors, conver- gence problems and numerical problems, were addressed and solved. Noise models were added to the Verilog-A based model to be consistent with the Cadence built-in model. The DC, ac, noise and large signal simulation comparisons showed identical results for the Verilog-A based VBIC modeling and the Cadence built-in VBIC model. 98 Based on the new Verilog-A based VBIC model, two applications for SiGe HBTs noise modeling were presented in Chapter 5. First, a new inverse circuit simulation based low frequency noise extraction method was prosed based on the Verilog-A based VBIC model. The low frequency noise of device biasing at high current can be mea- sured more accurately through this method. Second, to better understand the di?erent phase noise upconversion mechanisms of the base current 1/f noise and base current short noise in oscillator design, the internal I BE and the internal I CE were separated from the external I BE and the external I CE using Verilog-A based VBIC model. The results showed that the noise generating current I BE made up only a small portion of the terminal I B . A group of improved temperature mapping models for modeling DC currents down to 43 K were presented in Chapter 6. The new VBIC based new model was implemented using Verilog-A, compiled into binary code, and dynamically linked to a circuit simula- tor (ADS) through its compact modeling interface. The detailed coding of the Verilog-A based VBIC model with a group of improved temperature mapping models was docu- mented in Appendix A. Excellent Gummel and output fitting across a wide temperature range from 300 K down to 43 K were achieved for a 50 GHz SiGe HBT device. The intermodulation linearity simulation capability of the VBIC, HICUM and Mex- tram models were evaluated using harmonic balance in a 200 GHz SiGe HBT device in Chapter 7. The impact of avalanche and selfheating on IIP3 were examined. The results showed that a weak avalanche has a significant impact on IIP3. 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Pan, and D.C. Sheridan, ?Characterization and mod- eling of intermodulation linearity in a 200 GHz SiGe HBT technology,? IEEE Bipolar/BiCMOS Circuits and Technology Meeting, Oct. 2006. 104 APPENDIX A VERILOG-A CODE WITH KEY IMPROVED TEMPERATURE MAPPING MODELS A.1 Improved N F and N EI Temperature Mapping Models According to (6.6) in Chapter 6, the improved temperature model for N F and N EI in Verilog-A based model is as follows. NFatT = NF*(1.0+dT*Tnf+Anf*(pow(rT, Xnf)-1)); NEIatT = NEI*(1.0+dT*Tnei+Anei*(pow(rT, Xnei)-1)); Table A.1 lists the value of the parameters in the improved models. Parameter Value Parameter Value NF 1.00072 NEI 1.0001 Tnf -0.00018 Tnei -0.00005 Anf 0.0012 Anei 0.0012 Xnf -2.94 Xnei -2.89 Table A.1: Parameters used for improved N F and N EI temperature mapping models. 105 A.2 Improved E a,true , I S and I BEI Temperature Mapping Models According to (6.27) and (6.29) in Chapter 6, the improved temperature model for E a,true and I S in Verilog-A based model is as follows. EAatT = EA+EAalpha*pow(EAbeta,2)*pow(Tini,2)*(rT-1) /(pow((EAbeta+Tini),2)*(EAbeta+Tdev)); EAIEatT = EAIE+EAIEalpha*pow(EAIEbeta,2)*pow(Tini,2)*(rT-1) /(pow((EAIEbeta+Tini),2)*(EAIEbeta+Tdev)); ISatT = IS*pow((pow(rT,XIS)* limexp(-EAatT*(1.0-rT)/Vtv)),(1.0/NFatT)); IBEIatT = IBEI*pow((pow(rT,XII)* limexp(-EAIEatT*(1.0-rT)/Vtv)),(1.0/NEIatT)); Table A.2 lists the value of the parameters in the improved models. Parameter Value Parameter Value IS 1.62694e-18 IBEI 1.09629e-20 XIS 1.78 XII 1.78 EA 1.13 EAIE 1.145 EAalpha 2 EAIEalpha 2.7 EAbeta 1.326 EAIEbeta 1.21 Table A.2: Parameters used for improved E a,true , I S and I BEI temperature mapping models. 106 A.3 Improved I KF Temperature Mapping Model According to (6.30) in Chapter 6, the improved temperature model for I KF in Verilog-A based model is as follows. IKFatT = IKF*(1.0-dT*Tikf+Aikf*(pow(rT, Xikf)-1)); Table A.3 lists the value of the parameters in the improved models. Parameter Value IKF 0.00382 Tikf 0.00141 Aikf 2.64 Xikf 0.355 Table A.3: Parameters used for improved I KF temperature mapping model. 107