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Analysis and Optimization of Lithographic Performance on Massively-Parallel Electron-beam Systems
Hasan, Md Nabid (2023-04-24) ETD File Embargoed
While electron-beam (e-beam) lithography is widely used in transferring fine-feature patterns onto a substrate, its major drawback is the low throughput, especially for large-scale patterns. The massively-parallel electron-beam ...