Browsing by Author "Lee, Soo-Young"

Now showing items 1-11 of 11

Analysis and Correction of Three-Dimensional Proximity Effect in Binary E-Beam Nano-Lithography

Anbumony, Kasi (2007-05-15)

One of the fundamental problems in transferring a circuit pattern onto a substrate using electron beam lithography is the proximity effect, which is due to electron scattering in the resist and results in the ``non-ideal"" ...

Analysis and Optimization of Lithographic Performance on Massively-Parallel Electron-beam Systems

Hasan, Md Nabid (2023-04-24) ETD File Embargoed

While electron-beam (e-beam) lithography is widely used in transferring fine-feature patterns onto a substrate, its major drawback is the low throughput, especially for large-scale patterns. The massively-parallel electron-beam ...

Analytic Derivation and Minimization of Line Edge Roughness in Electron-beam Lithography

Rui, Guo (2017-12-01)

Electron-beam (e-beam) lithography is widely employed in a variety of areas such as fabrication of photomasks, imprint lithography molds, and experimental circuit patterns, etc., because of its ability to transfer ultra-fine ...

Doubly-Selective Channel Estimation and Equalization Using Superimposed Training and Basis Expansion Models

He, Shuangchi (2007-08-15)

Owing to multipath propagation and Doppler spread, typical wireless channels are both frequency- and time-selective (doubly-selective). In this dissertation, we concentrate on channel estimation and equalization over ...

Fast Estimation of Specific Absorption Rate for Magnetic Resonance Imaging

Shao, Yu (2015-07-02)

Specific absorption rate (SAR) is a main safety concern in magnetic resonance imaging (MRI). The radio frequency (RF) power deposition and SAR level have a significant impact on RF coil and pulse design. In high field MRI, ...

Modeling and Optimization of Parallel Matrix-based Computations on GPU

White, Andrew (2013-04-22)

As graphics processing units (GPUs) are continually being utilized as coprocessors, the demand for optimally utilizing them for various applications continues to grow. This work narrows the gap between programmers and ...

Novel Techniques for the Design and Characterization of Electromagnetic Devices with Application to Multilayer Structures and Waveguide Filters

Faircloth, Daniel (2006-05-15)

In this work, optimization methods are presented for the analysis of inverse and design problems in electromagnetics. The current and future demands placed on design engineers necessitate the hybridization of forward ...

A Parallel Implementation of Fault Simulation on a Cluster of Workstations

Han, Kyung (2006-12-15)

Parallel simulation on a cluster workstations is one method by which fault simulation time for large circuits can be reduced significantly. To get near-linear speedups from parallel processing, parallelization methods ...

Step-width Adjustment and Sidewall Control in Electron-beam Lithography

Li, Pengcheng (2010-11-16)

Two-dimensional (2-D) patterns and three-dimensional (3-D) structures increasingly find applications in various devices such as diffractive optical elements, photonic element, microelectromechanical systems (MEMS) etc. ...

Tag line tracking and Cardiac Motion Modeling from Tagged MRI

Li, Jin (2006-12-15)

Magnetic resonance (MR) tagging magnetically labels specified regions of the myocardium, which appear in the MR images with a spatially encoded pattern of dark stripes called tag lines. The deformation of these tag lines ...

True Three-Dimensional Proximity Effect Correction in Electron-beam Lithography: Control of Critical Dimension and Sidewall Shape

Dai, Qing (2013-04-23)

One of the major limiting factors in electron-beam (e-beam) lithography is the geometric distortion of written features due to electron scattering, i.e., proximity effect, which puts a fundamental limit on the minimum ...