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Browsing by Author "Lee, Soo-young"
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Designing an Anisotropic Noise Filter for Measuring Critical Dimension and Line Edge Roughness from SEM Images
Ji, Hyesung (2018-04-23)
The scanning electron microscope (SEM) is often employed in inspecting patterns transferred through a lithographic process. A typical inspection is to measure the critical dimension (CD) and line edge roughness (LER) of ...
Heterogeneity-Aware Approaches to Optimizing Performance of Computing and Communication Tasks
Huang, Jun (2005-12-15)
As the domain of computing and communication systems grows, heterogeneity among computers and subnetworks employed for a task also increases. It is important to understand how heterogeneity affects performance of computing ...
Modeling and Optimization of Electron-Beam Lithographic Process
Li, Dehua (2021-07-15)
An important issue in electron-beam (e-beam) lithography is to minimize the critical dimension (CD) error and line edge roughness (LER). This dissertation presents a method to measure the CD and LER from scanning electron ...