Small Signal Equivalent Circuit Extraction and RF Noise Analysis in 28nm High-k/ Metal Gate RF CMOS
Metadata Field | Value | Language |
---|---|---|
dc.contributor.advisor | Niu, Guofu | en_US |
dc.contributor.author | Zhang, Huaiyuan | en_US |
dc.date.accessioned | 2015-12-10T22:07:24Z | |
dc.date.available | 2015-12-10T22:07:24Z | |
dc.date.issued | 2015-12-10 | |
dc.identifier.uri | http://hdl.handle.net/10415/4968 | |
dc.description.abstract | This work extracts RF noise in a 28nm high-k/metal gate RF CMOS technology using a small signal equivalent circuit. All extrinsic and intrinsic small-signal parameters are extracted from measured data as well as scaling result of each parameters. For noise analysis, Sid/4kTgd0 is extracted, and its intrinsic value remains less than 2 despite a large increase from 1 at 90nm gate length, as well as a much stronger increase with VDS. The gate resistance noise is shown to be a significant noise performance limiter in such technology due to a large vertical metal interface component that is inversely proportional to gate area, W × L. | en_US |
dc.rights | EMBARGO_GLOBAL | en_US |
dc.subject | Electrical Engineering | en_US |
dc.title | Small Signal Equivalent Circuit Extraction and RF Noise Analysis in 28nm High-k/ Metal Gate RF CMOS | en_US |
dc.type | Master's Thesis | en_US |
dc.embargo.length | MONTHS_WITHHELD:49 | en_US |
dc.embargo.status | EMBARGOED | en_US |
dc.embargo.enddate | 2019-12-12 | en_US |
dc.contributor.committee | Dai, Fa | en_US |
dc.contributor.committee | Hamilton, Michael | en_US |